Fabrication of MoOx/Mo2C-Layered Hybrid Structures by Direct Thermal Oxidation of Mo2C

Yang, Leilei2; Chen, Wenjun2; Yang, Rongliang2; Chen, Anqi3; Zhang, Hao4; Sun, Yibo2; Jia, Yufei2; Li, Xinming5; Tang, Zikang1; Gui, Xuchun2

2020-03-04

10.1021/acsami.9b18650

ACS Applied Materials & Interfaces   影响因子和分区

1944-8244

1944-8252

Two-dimensional (2D) Mo2C, as a new member member of transition metal carbides, has many intriguing properties and potential applications in superconductors and electronic devices. The thermal stability of 2D materials is essential for the performance of the related devices, especially the ones with a vertical heterostructure. However, rare reports have demonstrated the thermal stability of Mo2C and the effects of thermal stability on its performance. Here, we propose a facile and controllable method to directly oxidize Mo2C to MoO, forming a MoOx/Mo2C heterostructure. During the oxidization process, an in situ technique is employed to uncover the transformation and thermal stability of the Mo2C. The chemical vapor deposition Mo2C shows high structural stability below 550 degrees C in Ar or below 350 degrees C in O-2, which demonstrates the high thermal stability and antioxidation of the Mo2C film. The metallic Mo2C is gradually oxidized to semiconducting MoOx as the temperature increases above 350 degrees C. The oxidization rate can be easily controlled by adjusting the oxidation temperature and time. Further, the obtained MoOx/Mo2C vertical hybrid structure shows obvious Schottky junction behaviors, strongly indicating the perfect interfacial contact between the component layers. This work offers a new strategy for the controllable fabrication of high-quality 2D heterostructures.

two-dimensional materials Mo2C MoOx heterostructures Schottky junction

EI ; SCI

英语

其他

National Natural Science Foundation of China[51772335]

Science & Technology - Other Topics ; Materials Science

Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary

WOS:000518702300071

AMER CHEMICAL SOC

20200908249065

Carbides ; Chemical stability ; Chemical vapor deposition ; Fabrication ; Heterojunctions ; Molybdenum oxide ; Thermooxidation ; Transition metals

Metallurgy and Metallography:531 ; Thermodynamics:641.1 ; Semiconductor Devices and Integrated Circuits:714.2 ; Chemistry:801 ; Chemical Reactions:802.2 ; Chemical Products Generally:804 ; Inorganic Compounds:804.2

EV Compendex

1.Univ Macau, Inst Appl Phys & Mat Engn, Taipa 999078, Macao, Peoples R China
2.Sun Yat Sen Univ, State Key Lab Optoelect Mat & Technol, Sch Elect & Informat Technol, Guangzhou 510275, Peoples R China
3.Southern Univ Sci & Technol, Coll Innovat & Entrepreneurship, Shenzhen 518055, Peoples R China
4.Sun Yat Sen Univ, Instrumental Anal & Res Ctr IARC, Guangzhou 510275, Peoples R China
5.South China Normal Univ, Guangdong Prov Key Lab Nanophoton Funct Mat & Dev, Sch Informat & Optoelect Sci & Engn, Guangzhou 510006, Peoples R China

Yang, Leilei,Chen, Wenjun,Yang, Rongliang,et al. Fabrication of MoOx/Mo2C-Layered Hybrid Structures by Direct Thermal Oxidation of Mo2C[J]. ACS Applied Materials & Interfaces,2020,12(9):10755-10762.

Yang, Leilei.,Chen, Wenjun.,Yang, Rongliang.,Chen, Anqi.,Zhang, Hao.,...&Gui, Xuchun.(2020).Fabrication of MoOx/Mo2C-Layered Hybrid Structures by Direct Thermal Oxidation of Mo2C.ACS Applied Materials & Interfaces,12(9),10755-10762.

Yang, Leilei,et al."Fabrication of MoOx/Mo2C-Layered Hybrid Structures by Direct Thermal Oxidation of Mo2C".ACS Applied Materials & Interfaces 12.9(2020):10755-10762.