Large form birefringence realized by dielectric subwavelength grating

Quan，Dunhang1; Jia，Hao3; Li，Weihao2; Cheng，Xing2; Kwok，Hoi Sing1

10.1002/sdtp.13123

2019

0097-966X

2168-0159

Digest of Technical Papers - SID International Symposium

50

Book 2

1110-1113

We present a detailed investigation of form birefringence realized by subwavelength grating based on high refractive index dielectric materials, e.g. titanium dioxide. The anticipated degree of birefringence is evaluated using Finite-Difference Time-Domain simulation of designed optical structure and in good accordance with the theoretical prediction. The designed subwavelength grating was fabricated using electron beam lithography and subsequent ICP dry etching technique on fused silica substrate. The artificial grating was then characterized under SEM and AFM, and a large birefringence 0.33 was obtained which can be furtherly improved with deposition process optimization.

FDTD simulation Form birefringence Nanofabrication Subwavelength grating Titanium dioxide

其他

英语

EI

20200908241661

Birefringence ; Electron beam lithography ; Refractive index ; Electron beams ; Fused silica ; High-k dielectric ; Nanotechnology ; Finite difference time domain method ; Optimization

Dielectric Materials:708.1 ; Light/Optics:741.1 ; Nanotechnology:761 ; Inorganic Compounds:804.2 ; Glass:812.3 ; Mathematics:921 ; Optimization Techniques:921.5

2-s2.0-85081156104

Scopus

1.State Key Laboratory of Advanced Displays and Optoelectronics Technologies,Hong Kong University of Science and Technology,Kowloon,Hong Kong
2.department of Material Science and Engineering,Southern University of Science and Technology,Shenzhen,China
3.Institute for Quantum Science and Engineering,Southern University of Science and Technology,Shenzhen,China

Quan，Dunhang,Jia，Hao,Li，Weihao,et al. Large form birefringence realized by dielectric subwavelength grating[C],2019:1110-1113.