A dummy-pattern-assisted lift-off method for small and dense nanostructures

Duan，Tianli1; Xu，Kang2; Wang，Yao1; Ma，Xuhang1; Zhang，Rui1; Gu，Chengjie3

10.1088/1757-899X/774/1/012116

2020-03-26

1757-8981

1757-899X

IOP Conference Series: Materials Science and Engineering

774

1

Nanostructures have attracted much attention because of wide application. Moreover, most of the nanostructures play the function through small and dense patterns in irregular shape, which indicates that the fabrication process is utmost important. In general, a lift-off process is used to transfer the pattern from resist to substrate. However, for small and dense patterns, the lift-off does not work well. In this paper, a dummy-pattern-assisted lift-off method is present. With added dummy patterns, a deep and thin valley forms on the resist but does not contact the substrate. The following deposited metal film may not fully cover the valley or form a weak connection in the valley. Therefore, the metal film is easily lifted off in the valley when the sample is dipped in the acetone, which could result in a successful lift-off. This novelty method is able to improve the quality of nanofabrication by lift-off process.

Electron beam lithography Fabrication process Lift-off Nanostructure

第一

英语

EI

20201808593223

Acetone ; Electron beam lithography ; Landforms ; Fabrication ; Metallic films

Geology:481.1 ; Nanotechnology:761 ; Organic Compounds:804.1 ; Solid State Physics:933

2-s2.0-85083017485

Scopus

1.Materials Characterization and Preparation,Southern University of Science and Technology,Shenzhen,518055,China
2.Mechanical and Energy Engineering,Southern University of Science and Technology,Shenzhen,518055,China
3.Division of Microelectronics,School of Science,Ningbo University,Zhejiang,315211,China

Duan，Tianli,Xu，Kang,Wang，Yao,et al. A dummy-pattern-assisted lift-off method for small and dense nanostructures[C],2020.