题名 | Thermal annealing effect on the electrical quality of graphene/hexagonal boron nitride heterostructure devices |
作者 | |
通讯作者 | Pan, Haiyang |
发表日期 | 2020-08-28
|
DOI | |
发表期刊 | |
ISSN | 0957-4484
|
EISSN | 1361-6528
|
卷号 | 31期号:35 |
摘要 | The development of the dry transfer method provides an abundant platform to construct various heterostructures of two-dimensional materials. However, the surface and interface cleanliness are essential to realize high electronical performance of heterostructures devices. Here, we demonstrated thermal annealing effect on the mobility and electrical transport properties of graphene on hexagonal boron nitride heterostructures devices. With different annealing temperature recipes for graphene on hexagonal boron nitride devices, we found annealing temperature at 300 degrees C can clean resist residual and achieve high mobility. Atomic force microscopy results also present a clean surface and small average root mean square roughness as low as 210 pm. Well defined oscillations and plateaus of electrical transport at low magnetic field indicate a high-quality graphene surface. |
关键词 | |
相关链接 | [来源记录] |
收录类别 | |
语种 | 英语
|
学校署名 | 第一
; 通讯
|
资助项目 | National Natural Science Foundation of China[11904311]
|
WOS研究方向 | Science & Technology - Other Topics
; Materials Science
; Physics
|
WOS类目 | Nanoscience & Nanotechnology
; Materials Science, Multidisciplinary
; Physics, Applied
|
WOS记录号 | WOS:000543074300001
|
出版者 | |
EI入藏号 | 20202808909367
|
EI主题词 | Semiconductor devices
; Nitrides
; Boron nitride
; Annealing
; Graphene devices
; III-V semiconductors
|
EI分类号 | Heat Treatment Processes:537.1
; Semiconducting Materials:712.1
; Semiconductor Devices and Integrated Circuits:714.2
; Nanotechnology:761
; Chemical Products Generally:804
; Inorganic Compounds:804.2
|
ESI学科分类 | MATERIALS SCIENCE
|
来源库 | Web of Science
|
引用统计 |
被引频次[WOS]:4
|
成果类型 | 期刊论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/140667 |
专题 | 理学院_物理系 |
作者单位 | 1.Southern Univ Sci & Technol, Dept Phys, Shenzhen 518055, Peoples R China 2.Southeast Univ, Dept Phys, Nanjing 211189, Peoples R China 3.China West Normal Univ, Coll Phys & Space Sci, Nanchong 637002, Peoples R China 4.Yancheng Inst Technol, Key Lab Adv Technol Environm Protect Jiangsu Prov, Yancheng 224051, Peoples R China |
第一作者单位 | 物理系 |
通讯作者单位 | 物理系 |
第一作者的第一单位 | 物理系 |
推荐引用方式 GB/T 7714 |
Pan, Haiyang,Wang, Qiaoming,Wu, Xiaohua,et al. Thermal annealing effect on the electrical quality of graphene/hexagonal boron nitride heterostructure devices[J]. NANOTECHNOLOGY,2020,31(35).
|
APA |
Pan, Haiyang,Wang, Qiaoming,Wu, Xiaohua,Song, Tingting,Song, Qiuming,&Wang, Jue.(2020).Thermal annealing effect on the electrical quality of graphene/hexagonal boron nitride heterostructure devices.NANOTECHNOLOGY,31(35).
|
MLA |
Pan, Haiyang,et al."Thermal annealing effect on the electrical quality of graphene/hexagonal boron nitride heterostructure devices".NANOTECHNOLOGY 31.35(2020).
|
条目包含的文件 | 条目无相关文件。 |
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