中文版 | English
题名

Thermal annealing effect on the electrical quality of graphene/hexagonal boron nitride heterostructure devices

作者
通讯作者Pan, Haiyang
发表日期
2020-08-28
DOI
发表期刊
ISSN
0957-4484
EISSN
1361-6528
卷号31期号:35
摘要
The development of the dry transfer method provides an abundant platform to construct various heterostructures of two-dimensional materials. However, the surface and interface cleanliness are essential to realize high electronical performance of heterostructures devices. Here, we demonstrated thermal annealing effect on the mobility and electrical transport properties of graphene on hexagonal boron nitride heterostructures devices. With different annealing temperature recipes for graphene on hexagonal boron nitride devices, we found annealing temperature at 300 degrees C can clean resist residual and achieve high mobility. Atomic force microscopy results also present a clean surface and small average root mean square roughness as low as 210 pm. Well defined oscillations and plateaus of electrical transport at low magnetic field indicate a high-quality graphene surface.
关键词
相关链接[来源记录]
收录类别
SCI ; EI
语种
英语
学校署名
第一 ; 通讯
资助项目
National Natural Science Foundation of China[11904311]
WOS研究方向
Science & Technology - Other Topics ; Materials Science ; Physics
WOS类目
Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied
WOS记录号
WOS:000543074300001
出版者
EI入藏号
20202808909367
EI主题词
Semiconductor devices ; Nitrides ; Boron nitride ; Annealing ; Graphene devices ; III-V semiconductors
EI分类号
Heat Treatment Processes:537.1 ; Semiconducting Materials:712.1 ; Semiconductor Devices and Integrated Circuits:714.2 ; Nanotechnology:761 ; Chemical Products Generally:804 ; Inorganic Compounds:804.2
ESI学科分类
MATERIALS SCIENCE
来源库
Web of Science
引用统计
被引频次[WOS]:4
成果类型期刊论文
条目标识符http://sustech.caswiz.com/handle/2SGJ60CL/140667
专题理学院_物理系
作者单位
1.Southern Univ Sci & Technol, Dept Phys, Shenzhen 518055, Peoples R China
2.Southeast Univ, Dept Phys, Nanjing 211189, Peoples R China
3.China West Normal Univ, Coll Phys & Space Sci, Nanchong 637002, Peoples R China
4.Yancheng Inst Technol, Key Lab Adv Technol Environm Protect Jiangsu Prov, Yancheng 224051, Peoples R China
第一作者单位物理系
通讯作者单位物理系
第一作者的第一单位物理系
推荐引用方式
GB/T 7714
Pan, Haiyang,Wang, Qiaoming,Wu, Xiaohua,et al. Thermal annealing effect on the electrical quality of graphene/hexagonal boron nitride heterostructure devices[J]. NANOTECHNOLOGY,2020,31(35).
APA
Pan, Haiyang,Wang, Qiaoming,Wu, Xiaohua,Song, Tingting,Song, Qiuming,&Wang, Jue.(2020).Thermal annealing effect on the electrical quality of graphene/hexagonal boron nitride heterostructure devices.NANOTECHNOLOGY,31(35).
MLA
Pan, Haiyang,et al."Thermal annealing effect on the electrical quality of graphene/hexagonal boron nitride heterostructure devices".NANOTECHNOLOGY 31.35(2020).
条目包含的文件
条目无相关文件。
个性服务
原文链接
推荐该条目
保存到收藏夹
查看访问统计
导出为Endnote文件
导出为Excel格式
导出为Csv格式
Altmetrics Score
谷歌学术
谷歌学术中相似的文章
[Pan, Haiyang]的文章
[Wang, Qiaoming]的文章
[Wu, Xiaohua]的文章
百度学术
百度学术中相似的文章
[Pan, Haiyang]的文章
[Wang, Qiaoming]的文章
[Wu, Xiaohua]的文章
必应学术
必应学术中相似的文章
[Pan, Haiyang]的文章
[Wang, Qiaoming]的文章
[Wu, Xiaohua]的文章
相关权益政策
暂无数据
收藏/分享
所有评论 (0)
[发表评论/异议/意见]
暂无评论

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。