题名 | Printed High-k Dielectric for Flexible Low-Power Extended Gate Field-Effect Transistor in Sensing Pressure |
作者 | |
通讯作者 | Xu, Zong-Xiang; Roy, Vellaisamy A. L. |
发表日期 | 2019-05
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DOI | |
发表期刊 | |
ISSN | 2637-6113
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卷号 | 1期号:5页码:711-717 |
摘要 | Recently, flexible organic field-effect transistor (OFET)-based pressure sensors have been attracting significant interest for promising applications in electronic skin (e-skin) and wearable healthcare monitoring systems. However, it is still challenging to achieve the low-power flexible OFET-based pressure sensors by a simple and costeffective approach. Herein, high-k Al2O3 dielectrics on aluminum foil have been developed by a simple printing approach, and their applications in flexible low-power organic field-effect transistors (OFETs) and pressure sensor are presented. The high-k Al2O3 dielectric films prepared by our method are robust and large-area compatible, leading to a high areal capacitance and low leakage current density. Furthermore, the flexible OFET devices based on the printed Al2O3 dielectric film exhibit a field-effect mobility of 0.65 cm(2)/(V s), current on/off ratio up to 10(5), and good mechanical stability. Additionally, the OFET devices exhibit excellent uniformity, indicating the printed Al2O3 dielectric is a promising candidate to fabricate the OFETs on a large scale. The extended gate OFET-based pressure sensor achieves a high pressure sensitivity of 8 kPa(-1) at an operation voltage as low as -2 V and a fast response time of <100 ms. On the merits of the high-k dielectric constant, low leakage current, and large-area compatibility, the printed Al2O3 prepared by our method will boost the development of the flexible low-power transistor-based pressure sensors for e-skin and heath monitoring applications. |
关键词 | |
相关链接 | [来源记录] |
收录类别 | |
语种 | 英语
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学校署名 | 通讯
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资助项目 | City University of Hong Kong's Applied Research Grant Project[9667145]
; RGC of Hong Kong Project[T42 -103/16N]
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WOS研究方向 | Engineering
; Materials Science
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WOS类目 | Engineering, Electrical & Electronic
; Materials Science, Multidisciplinary
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WOS记录号 | WOS:000496312700010
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出版者 | |
EI入藏号 | 20212010361290
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EI主题词 | Alumina
; Aluminum oxide
; Capacitance
; Cost effectiveness
; Dielectric materials
; Film preparation
; High-k dielectric
; Leakage currents
; Mechanical stability
; Pressure effects
; Pressure sensors
; Transistors
; Wearable sensors
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EI分类号 | Electricity: Basic Concepts and Phenomena:701.1
; Dielectric Materials:708.1
; Semiconductor Devices and Integrated Circuits:714.2
; Inorganic Compounds:804.2
; Industrial Economics:911.2
; Mechanics:931.1
; Pressure Measuring Instruments:944.3
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来源库 | Web of Science
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引用统计 |
被引频次[WOS]:27
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成果类型 | 期刊论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/141491 |
专题 | 理学院_化学系 |
作者单位 | 1.City Univ Hong Kong, State Key Lab Terahertz & Millimeter Waves, Kowloon, Tat Chee Ave, Hong Kong, Peoples R China 2.City Univ Hong Kong, Dept Mat Sci & Engn, Kowloon, Tat Chee Ave, Hong Kong, Peoples R China 3.Southern Univ Sci & Technol, Dept Chem, Shenzhen 518055, Guangdong, Peoples R China |
通讯作者单位 | 化学系 |
推荐引用方式 GB/T 7714 |
Sun, Qi-Jun,Li, Tan,Wu, Wei,et al. Printed High-k Dielectric for Flexible Low-Power Extended Gate Field-Effect Transistor in Sensing Pressure[J]. ACS Applied Electronic Materials,2019,1(5):711-717.
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APA |
Sun, Qi-Jun.,Li, Tan.,Wu, Wei.,Venkatesh, Shishir.,Zhao, Xin-Hua.,...&Roy, Vellaisamy A. L..(2019).Printed High-k Dielectric for Flexible Low-Power Extended Gate Field-Effect Transistor in Sensing Pressure.ACS Applied Electronic Materials,1(5),711-717.
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MLA |
Sun, Qi-Jun,et al."Printed High-k Dielectric for Flexible Low-Power Extended Gate Field-Effect Transistor in Sensing Pressure".ACS Applied Electronic Materials 1.5(2019):711-717.
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条目包含的文件 | ||||||
文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | 操作 | |
ACS APPL. Electron. (3172KB) | 期刊论文 | 作者接受稿 | 限制开放 | CC BY-NC-SA |
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