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题名

Printed High-k Dielectric for Flexible Low-Power Extended Gate Field-Effect Transistor in Sensing Pressure

作者
通讯作者Xu, Zong-Xiang; Roy, Vellaisamy A. L.
发表日期
2019-05
DOI
发表期刊
ISSN
2637-6113
卷号1期号:5页码:711-717
摘要

Recently, flexible organic field-effect transistor (OFET)-based pressure sensors have been attracting significant interest for promising applications in electronic skin (e-skin) and wearable healthcare monitoring systems. However, it is still challenging to achieve the low-power flexible OFET-based pressure sensors by a simple and costeffective approach. Herein, high-k Al2O3 dielectrics on aluminum foil have been developed by a simple printing approach, and their applications in flexible low-power organic field-effect transistors (OFETs) and pressure sensor are presented. The high-k Al2O3 dielectric films prepared by our method are robust and large-area compatible, leading to a high areal capacitance and low leakage current density. Furthermore, the flexible OFET devices based on the printed Al2O3 dielectric film exhibit a field-effect mobility of 0.65 cm(2)/(V s), current on/off ratio up to 10(5), and good mechanical stability. Additionally, the OFET devices exhibit excellent uniformity, indicating the printed Al2O3 dielectric is a promising candidate to fabricate the OFETs on a large scale. The extended gate OFET-based pressure sensor achieves a high pressure sensitivity of 8 kPa(-1) at an operation voltage as low as -2 V and a fast response time of <100 ms. On the merits of the high-k dielectric constant, low leakage current, and large-area compatibility, the printed Al2O3 prepared by our method will boost the development of the flexible low-power transistor-based pressure sensors for e-skin and heath monitoring applications.

关键词
相关链接[来源记录]
收录类别
ESCI ; EI
语种
英语
学校署名
通讯
资助项目
City University of Hong Kong's Applied Research Grant Project[9667145] ; RGC of Hong Kong Project[T42 -103/16N]
WOS研究方向
Engineering ; Materials Science
WOS类目
Engineering, Electrical & Electronic ; Materials Science, Multidisciplinary
WOS记录号
WOS:000496312700010
出版者
EI入藏号
20212010361290
EI主题词
Alumina ; Aluminum oxide ; Capacitance ; Cost effectiveness ; Dielectric materials ; Film preparation ; High-k dielectric ; Leakage currents ; Mechanical stability ; Pressure effects ; Pressure sensors ; Transistors ; Wearable sensors
EI分类号
Electricity: Basic Concepts and Phenomena:701.1 ; Dielectric Materials:708.1 ; Semiconductor Devices and Integrated Circuits:714.2 ; Inorganic Compounds:804.2 ; Industrial Economics:911.2 ; Mechanics:931.1 ; Pressure Measuring Instruments:944.3
来源库
Web of Science
引用统计
被引频次[WOS]:27
成果类型期刊论文
条目标识符http://sustech.caswiz.com/handle/2SGJ60CL/141491
专题理学院_化学系
作者单位
1.City Univ Hong Kong, State Key Lab Terahertz & Millimeter Waves, Kowloon, Tat Chee Ave, Hong Kong, Peoples R China
2.City Univ Hong Kong, Dept Mat Sci & Engn, Kowloon, Tat Chee Ave, Hong Kong, Peoples R China
3.Southern Univ Sci & Technol, Dept Chem, Shenzhen 518055, Guangdong, Peoples R China
通讯作者单位化学系
推荐引用方式
GB/T 7714
Sun, Qi-Jun,Li, Tan,Wu, Wei,et al. Printed High-k Dielectric for Flexible Low-Power Extended Gate Field-Effect Transistor in Sensing Pressure[J]. ACS Applied Electronic Materials,2019,1(5):711-717.
APA
Sun, Qi-Jun.,Li, Tan.,Wu, Wei.,Venkatesh, Shishir.,Zhao, Xin-Hua.,...&Roy, Vellaisamy A. L..(2019).Printed High-k Dielectric for Flexible Low-Power Extended Gate Field-Effect Transistor in Sensing Pressure.ACS Applied Electronic Materials,1(5),711-717.
MLA
Sun, Qi-Jun,et al."Printed High-k Dielectric for Flexible Low-Power Extended Gate Field-Effect Transistor in Sensing Pressure".ACS Applied Electronic Materials 1.5(2019):711-717.
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