Optical properties of ultrathin ZnO films fabricated by atomic layer deposition

Fang, Liping1; Li, Haolin1,2; Ma, Xuhang3; Song, Qiuming4; Chen, Rui1

2020-10-15

10.1016/j.apsusc.2020.146818

APPLIED SURFACE SCIENCE   影响因子和分区

0169-4332

1873-5584

Ultrathin zinc oxide (ZnO) films with thickness down to several nanometers have been fabricated by atomic layer deposition. The chemical composition, surface morphology, crystalline structure, optical properties and photoluminescence characteristics of the ZnO films with various thicknesses were investigated. The X-ray photoelectric spectroscopy illustrates that the deposited films are uniformly distributed with zinc and oxygen atoms. Spectroscopic ellipsometric measurements reveal that both the refractive index and extinction coefficient decrease monotonically as the thickness of the film decreases. The thickness of the ZnO films obtained via ellipsometry is consistent with X-ray reflectivity measurements. The excitonic emission peak of the photoluminescence spectrum shifts to higher energies when the film thickness decreases to a few nanometers. This blueshift phenomenon is consistent with the expansion of the fundamental optical bandgap determined from ellipsometry, which could be well described by the effective mass model using physically meaningful parameters. The results obtained in this study could provide guidance to the design and optimization of optoelectronic devices based on ultrathin ZnO films.

Ultrathin ZnO films OXIDE THIN-FILMS Optical properties QUANTUM DOTS Atomic layer deposition BAND-GAP Spectroscopic ellipsometry SIZE DEPENDENCE X-ray reflectivity GROWTH Quantum confinement SPECTROSCOPY ELECTRON

SCI ; EI

英语

第一 ; 通讯

National Nature Science Foundation of China[61604138]

Chemistry ; Materials Science ; Physics

Chemistry, Physical ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter

WOS:000564206200004

ELSEVIER

20202408813449

Atoms ; Optical films ; Morphology ; Spectroscopic ellipsometry ; II-VI semiconductors ; Photoelectricity ; Photoluminescence ; Surface morphology ; Ultrathin films ; Metallic films ; Reflection ; Semiconductor quantum wells ; Refractive index ; Oxide films ; Fabrication ; Optoelectronic devices ; Red Shift ; Zinc oxide

Electricity: Basic Concepts and Phenomena:701.1 ; Semiconducting Materials:712.1 ; Semiconductor Devices and Integrated Circuits:714.2 ; Light/Optics:741.1 ; Optical Devices and Systems:741.3 ; Inorganic Compounds:804.2 ; Coating Techniques:813.1 ; Physical Properties of Gases, Liquids and Solids:931.2 ; Atomic and Molecular Physics:931.3 ; Crystal Growth:933.1.2 ; Optical Variables Measurements:941.4 ; Materials Science:951

MATERIALS SCIENCE

Web of Science

1.Southern Univ Sci & Technol, Dept Elect & Elect Engn, Shenzhen 518055, Guangdong, Peoples R China;
2.Changchun Univ Sci & Technol, Sch Sci, State Key Lab High Power Semicond Laser, Changchun 130022, Peoples R China;
3.Southern Univ Sci & Technol, Core Res Facil, Shenzhen 518055, Guangdong, Peoples R China;
4.Southern Univ Sci & Technol, Shenzhen Inst Quantum Sci & Engn, Dept Phys, Shenzhen 518055, Guangdong, Peoples R China

Fang, Liping,Li, Haolin,Ma, Xuhang,et al. Optical properties of ultrathin ZnO films fabricated by atomic layer deposition[J]. APPLIED SURFACE SCIENCE,2020,527.

Fang, Liping,Li, Haolin,Ma, Xuhang,Song, Qiuming,&Chen, Rui.(2020).Optical properties of ultrathin ZnO films fabricated by atomic layer deposition.APPLIED SURFACE SCIENCE,527.

Fang, Liping,et al."Optical properties of ultrathin ZnO films fabricated by atomic layer deposition".APPLIED SURFACE SCIENCE 527(2020).