题名 | Structural transformations and desirable electronic properties of low-temperature grown ruthenium oxide films under nitrogen atmosphere |
作者 | |
通讯作者 | Hu,Sixia |
发表日期 | 2020-11-01
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DOI | |
发表期刊 | |
ISSN | 0272-8842
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EISSN | 1873-3956
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卷号 | 46期号:16页码:26055-26060 |
摘要 | SrRuO has recently attracted intense attentions for its intriguing physical properties. However, the ultra-high growth temperature (≥1000 °C) poses a major challenge for fabricating high-quality SrRuO films. In sharp contrast to effort previously attempted in traditional oxygen atmosphere, herein, a nitrogen gas is employed to grow ruthenium oxide films during pulsed laser depositions (PLD). It is shown that the present method facilitates a successive SrRuO–SrRuO structural transformation via increasing growth temperatures from 700 °C to 900 °C. The high-quality SrRuO film grown at a relative low deposition temperature exhibits a comparable electrical resistivity, in comparison with counterparts deposited at oxygen atmosphere. Combined X-ray photoelectron and X-ray absorption measurements suggest that the nonreactive nitrogen atmosphere involved during the deposition yields a relative lower kinetic energy of laser ablated plume reaching to substrates, and effectively regulates structural and electronic properties of ruthenium oxide films. These findings may offer a new route for synthesizing other oxide functional films with high deposition-temperature. |
关键词 | |
相关链接 | [Scopus记录] |
收录类别 | |
语种 | 英语
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学校署名 | 通讯
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资助项目 | Natural Science Foundation of SZU[827-000198]
; Guangdong Basic and Applied Basic Research Foundation[2019A1515011529]
; Anhui Initiative in Quantum Information Technologies[AHY100000]
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WOS研究方向 | Materials Science
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WOS类目 | Materials Science, Ceramics
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WOS记录号 | WOS:000577309500003
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出版者 | |
EI入藏号 | 20203209011325
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EI主题词 | Kinetic energy
; Oxide films
; Oxygen
; Strontium compounds
; Substrates
; Electronic properties
; Atmospheric temperature
; Growth temperature
; Nitrogen
; Kinetics
; Pulsed lasers
; Ruthenium compounds
|
EI分类号 | Atmospheric Properties:443.1
; Fluid Flow, General:631.1
; Lasers, General:744.1
; Laser Applications:744.9
; Chemical Products Generally:804
; Classical Physics; Quantum Theory; Relativity:931
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ESI学科分类 | MATERIALS SCIENCE
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Scopus记录号 | 2-s2.0-85088937905
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来源库 | Scopus
|
引用统计 |
被引频次[WOS]:0
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成果类型 | 期刊论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/187885 |
专题 | 公共分析测试中心 |
作者单位 | 1.Shenzhen Key Laboratory of Special Functional Materials,College of Materials Science and Engineering,Shenzhen University,Guangdong,518060,China 2.Sustech Core Research Facilities,Southern University of Science and Technology of China,Guangdong,518055,China 3.Anhui Laboratory of Advanced Photon Science and Technology,Hefei National Laboratory for Physical Sciences at the Microscale,University of Science and Technology of China,Hefei,230026,China 4.School of Physics and Electronic Engineering,Guangzhou University,Guangzhou,510006,China |
通讯作者单位 | 公共分析测试中心 |
推荐引用方式 GB/T 7714 |
Huang,Chuanwei,Qiu,Peiqi,Wei,Sicong,et al. Structural transformations and desirable electronic properties of low-temperature grown ruthenium oxide films under nitrogen atmosphere[J]. CERAMICS INTERNATIONAL,2020,46(16):26055-26060.
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APA |
Huang,Chuanwei.,Qiu,Peiqi.,Wei,Sicong.,Zeng,Xierong.,Hu,Sixia.,...&Huang,Haoliang.(2020).Structural transformations and desirable electronic properties of low-temperature grown ruthenium oxide films under nitrogen atmosphere.CERAMICS INTERNATIONAL,46(16),26055-26060.
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MLA |
Huang,Chuanwei,et al."Structural transformations and desirable electronic properties of low-temperature grown ruthenium oxide films under nitrogen atmosphere".CERAMICS INTERNATIONAL 46.16(2020):26055-26060.
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条目包含的文件 | 条目无相关文件。 |
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