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题名

2D Bi2Se3 van der waals epitaxy on mica for optoelectronics applications

作者
通讯作者Wang,Shifeng
发表日期
2020-09-01
DOI
发表期刊
ISSN
2079-4991
EISSN
2079-4991
卷号10期号:9页码:1-11
摘要
BiSe possesses a two-dimensional layered rhombohedral crystal structure, where the quintuple layers (QLs) are covalently bonded within the layers but weakly held together by van der Waals forces between the adjacent QLs. It is also pointed out that BiSe is a topological insulator, making it a promising candidate for a wide range of electronic and optoelectronic applications. In this study, we investigate the growth of high-quality BiSe thin films on mica by the molecular beam epitaxy technique. The films exhibited a layered structure and highly c-axis-preferred growth orientation with an XRD rocking curve full-width at half-maximum (FWHM) of 0.088, clearly demonstrating excellent crystallinity for the BiSe deposited on the mica substrate. The growth mechanism was studied by using an interface model associated with the coincidence site lattice unit (CSLU) developed for van der Waals epitaxies. This high (001) texture favors electron transport in the material. Hall measurements revealed a mobility of 726 cm /(Vs) at room temperature and up to 1469 cm/(Vs) at 12 K. The results illustrate excellent electron mobility arising from the superior crystallinity of the films with significant implications for applications in conducting electrodes in optoelectronic devices on flexible substrates.
关键词
相关链接[Scopus记录]
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语种
英语
学校署名
其他
资助项目
Wuhan University of Technology-Tibet University Joint Innovation Fund[LZJ2020003]
WOS研究方向
Science & Technology - Other Topics ; Materials Science
WOS类目
Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary
WOS记录号
WOS:000580677300001
出版者
Scopus记录号
2-s2.0-85090534265
来源库
Scopus
引用统计
被引频次[WOS]:17
成果类型期刊论文
条目标识符http://sustech.caswiz.com/handle/2SGJ60CL/187924
专题工学院_环境科学与工程学院
作者单位
1.Department of Physics,Innovation Laboratory of Materials for Energy and Environment Technologies,College of Science,Tibet University,Lhasa,850000,China
2.Institute of Oxygen Supply,Center of Tibetan Studies (Everest Research Institute),Tibet University,Lhasa,850000,China
3.Department of Electrical and Computer Engineering,Nazarbayev University,Nur-Sultan,010000,Kazakhstan
4.School of Environmental Science and Engineering,Southern University of Science and Technology,Shenzhen,518055,China
5.Engineering Innovation Center of Southern University of Science and Technology,Beijing,100083,China
推荐引用方式
GB/T 7714
Wang,Shifeng,Li,Yong,Ng,Annie,et al. 2D Bi2Se3 van der waals epitaxy on mica for optoelectronics applications[J]. Nanomaterials,2020,10(9):1-11.
APA
Wang,Shifeng.,Li,Yong.,Ng,Annie.,Hu,Qing.,Zhou,Qianyu.,...&Liu,Hao.(2020).2D Bi2Se3 van der waals epitaxy on mica for optoelectronics applications.Nanomaterials,10(9),1-11.
MLA
Wang,Shifeng,et al."2D Bi2Se3 van der waals epitaxy on mica for optoelectronics applications".Nanomaterials 10.9(2020):1-11.
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