Fundamental investigation of ultrasonic vibration assisted MCF (Magnetic Compound Fluid) polishing

Nomura，Mitsuyoshi1; Nojiri，Kenta2; Wu，Yongbo3; Fujii，Tatsuya1

2017

ISAAT 2017 - Proceedings of the 20th International Symposium on Advances in Abrasive Technology

747-752

This research deals with the development of an ultrasonic vibration assisted MCF (Magnetic Compound Fluid) polishing technology for final polishing. This paper describes the fabrication of an experimental apparatus composed mainly of an ultrasonic polishing unit, and the experimental investigation of its performance in surface polishing. In addition, investigation of ultrasonic vibration assisted MCF polishing under different applied methods of ultrasonic vibration was also conducted. The experimental results indicate that applying ultrasonic vibration to the workpiece improves the surface roughness and the material removal rate when the ultrasonic vibrations are changed. In addition, over the range of polishing conditions employed in this paper, the precision surface roughness and high material removal rate can be easily obtained on the acrylic plate by using an elliptical vibration is applied to the ultrasonic vibration.

Magnetic Compound Fluid (MCF) MCF slurry Surface roughness Ultrasonic vibration

其他

英语

EI

20204409421552

Magnetism ; Ultrasonic effects ; Ultrasonic waves ; Polishing

Machining Operations:604.2 ; Magnetism: Basic Concepts and Phenomena:701.2 ; Ultrasonic Waves:753.1 ; Physical Properties of Gases, Liquids and Solids:931.2

2-s2.0-85094102625

Scopus

1.Dept. of Machine Intelligence and Systems Engineering,Akita Prefectural University,Akita,84-4 Aza Ebinokuchi Tsuchiya Yurihonjo City,015-0055,Japan
2.DENSO TECHNO Co.,Ltd.,Obu City, Aichi,2-188 Chuo-cho,474-0025,Japan
3.Dept. of Mechanical and Energy Engineering,Southern University of Science and Technology,Nanshan, Shenzhen, Guangdong,1088 Xueyuan Rd.,518055 PRC,China

Nomura，Mitsuyoshi,Nojiri，Kenta,Wu，Yongbo,et al. Fundamental investigation of ultrasonic vibration assisted MCF (Magnetic Compound Fluid) polishing[C],2017:747-752.