Demolding force dependence on mold surface modifications in UV nanoimprint lithography

Li，Mingjie; Chen，Yulong; Luo，Wenxin; Cheng，Xing

2021-02-15

10.1016/j.mee.2020.111470

MICROELECTRONIC ENGINEERING   影响因子和分区

0167-9317

1873-5568

Nanoimprint lithography (NIL) has attracted broad interests in nano/micropatterning of photonic structures, however, one of the major challenges in NIL is the defect rate due to a large demolding force which causes difficult demolding. In this work, adhesion and friction stresses were obtained from the overall demolding force through measurements of the total demolding force and the geometries of the mold patterns. The friction stress on the sidewalls is generally larger than the adhesion stress between the mold and the resist. In addition, a conformal AlO layer grown via atomic layer deposition was introduced to cover the imprint mold and reduce the surface roughness on the sidewalls. Together with the coating of an anti-adhesion layer for easy mold releasing, both adhesion and friction stresses were reduced, leading to a lower total demolding force compared to the conventional mold with merely a hydrophobic surfactant layer or mold without any surface modification. The results obtained from this work will help the design and optimization of the NIL molds to mitigate the defect rate in UV-NIL.

Adhesion Atomic layer deposition Friction Stress UV-nanoimprint

SCI ; EI

英语

第一 ; 通讯

Shenzhen Science and Technology Innovation Committee for basic science[JCYJ20160301114303878] ; Shenzhen Key Laboratory for Nanoimprint Technology[ZDSYS20140509142721431]

Engineering ; Science & Technology - Other Topics ; Optics ; Physics

Engineering, Electrical & Electronic ; Nanoscience & Nanotechnology ; Optics ; Physics, Applied

WOS:000598523200008

ELSEVIER

20204709512976

Nanoimprint lithography ; Friction ; Alumina ; Aluminum oxide ; Surface roughness ; Atomic layer deposition ; Molds

Reproduction, Copying:745.2 ; Nanotechnology:761 ; Inorganic Compounds:804.2 ; Coating Techniques:813.1 ; Physical Properties of Gases, Liquids and Solids:931.2 ; Solid State Physics:933 ; Crystal Growth:933.1.2 ; Materials Science:951

ENGINEERING

2-s2.0-85096217633

Scopus

Shenzhen Key Laboratory for Nanoimprint Technology,Department of Materials Science and Engineering,Southern University of Science and Technology,Shenzhen,518055,China

Li，Mingjie,Chen，Yulong,Luo，Wenxin,et al. Demolding force dependence on mold surface modifications in UV nanoimprint lithography[J]. MICROELECTRONIC ENGINEERING,2021,236.

Li，Mingjie,Chen，Yulong,Luo，Wenxin,&Cheng，Xing.(2021).Demolding force dependence on mold surface modifications in UV nanoimprint lithography.MICROELECTRONIC ENGINEERING,236.

Li，Mingjie,et al."Demolding force dependence on mold surface modifications in UV nanoimprint lithography".MICROELECTRONIC ENGINEERING 236(2021).