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题名

Growth of GaN on monolayer hexagonal boron nitride by chemical vapor deposition for ultraviolet photodetectors

作者
通讯作者Zhang,Lei
发表日期
2020-10-01
DOI
发表期刊
ISSN
0268-1242
EISSN
1361-6641
卷号35期号:12
摘要
Chemical vapor deposition (CVD) technology is a simple and flexible method used to prepare high-quality crystalline materials. Traditional CVD technology, based on pre-deposited thin catalyst metal, usually produces nanostructures instead of continuous films. In this work, a continuous GaN film on a monolayer boron nitride (h-BN) insertion layer is demonstrated using CVD technology. The experimental results and theoretical calculations indicate that abundant GaN nanocrystallites are firstly formed at the edges or grain boundaries of the monolayer h-BN by quasi-van der Waals epitaxy. Then, the vapor-solid mechanism will control further growth of the GaN nanocrystallites, causing them to merge into a continuous GaN film. Meanwhile, the CVD-grown GaN ultraviolet detector exhibits a relatively high responsivity with a value of 0.57 A W at 2 V. In this paper, a simple low-cost CVD method is proposed for preparing continuous films on two-dimensional materials for electronic and optoelectronic devices. Supplementary material for this article is available online.
关键词
相关链接[Scopus记录]
收录类别
SCI ; EI
语种
英语
学校署名
其他
资助项目
National Key Research and Development Program of China[2018YFB0406702] ; Natural science foundation of Hunan province, China[2019JJ50751] ; Project of the State Key Laboratory of High-Performance Complex Manufacturing, Central South University, China[ZZYJKT2019-13][ZZYJKT2018-01][218091][217056]
WOS研究方向
Engineering ; Materials Science ; Physics
WOS类目
Engineering, Electrical & Electronic ; Materials Science, Multidisciplinary ; Physics, Condensed Matter
WOS记录号
WOS:000585695000001
出版者
EI入藏号
20204609495819
EI主题词
Gallium nitride ; Monolayers ; Nanocrystallites ; Photodetectors ; Photons ; Grain boundaries ; Boron nitride ; Diamond films ; Van der Waals forces ; Nanocrystals ; III-V semiconductors ; Nanocrystalline materials
EI分类号
Semiconducting Materials:712.1 ; Nanotechnology:761 ; Physical Chemistry:801.4 ; Chemical Reactions:802.2 ; Inorganic Compounds:804.2 ; Atomic and Molecular Physics:931.3 ; Solid State Physics:933 ; Crystalline Solids:933.1
ESI学科分类
PHYSICS
Scopus记录号
2-s2.0-85095972116
来源库
Scopus
引用统计
被引频次[WOS]:5
成果类型期刊论文
条目标识符http://sustech.caswiz.com/handle/2SGJ60CL/209457
专题工学院_电子与电气工程系
作者单位
1.State Key Laboratory of High Performance Complex Manufacturing,College of Mechanical and Electrical Engineering,Central South University,Changsha, Hunan,410083,China
2.Hunan Provincial Key Laboratory of Low-Dimensional Structural Physics and Devices,School of Physics and Electronics,Hunan University,Changsha, Hunan,410082,China
3.Department of Electrical & Electronic Engineering,Southern University of Science and Technology,Shenzhen, Guangdong,518055,China
推荐引用方式
GB/T 7714
Zhu,Wenhui,Si,Jiawei,Zhang,Lei,et al. Growth of GaN on monolayer hexagonal boron nitride by chemical vapor deposition for ultraviolet photodetectors[J]. SEMICONDUCTOR SCIENCE AND TECHNOLOGY,2020,35(12).
APA
Zhu,Wenhui.,Si,Jiawei.,Zhang,Lei.,Li,Tao.,Song,Wenqing.,...&Wang,Liancheng.(2020).Growth of GaN on monolayer hexagonal boron nitride by chemical vapor deposition for ultraviolet photodetectors.SEMICONDUCTOR SCIENCE AND TECHNOLOGY,35(12).
MLA
Zhu,Wenhui,et al."Growth of GaN on monolayer hexagonal boron nitride by chemical vapor deposition for ultraviolet photodetectors".SEMICONDUCTOR SCIENCE AND TECHNOLOGY 35.12(2020).
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