Low-temperature deposition and hardness enhancement of α-(Al,Cr)2O3films by reactive high power pulsed magnetron sputtering

Cheng，Yitian1,2; Chu，Chenglin2; Zhou，Peng1,3

2020-11-01

10.1088/2053-1591/abc7e1

Materials Research Express   影响因子和分区

2053-1591

2053-1591

This paper offers a method to grow corundum structure thin films of α-(Al,Cr)2O3 in a High Power Pulsed Magnetron Sputtering (HPPMS) system. The films were characterized by grazing incidence x-ray diffraction (GIXRD), scanning electron microscope (SEM), transmission electron microscope (TEM) and nanoindentation. The results indicate that stoichiometric α-(Al,Cr)2O3 film could be deposited at 540 °C without the formation of other metastable phases. The stable process of the magnetron sputtering ensures the smooth and compact surface of the film composed of nano-scale particles. The Cr in films can induce the formation of solid solution and enhance the mechanical property of the films. The hardness of the α-(Al,Cr)2O3 was calculated as ∼25.6 GPa, which is much higher than that of the film deposited using the Al target. These results are considered have positive effect on the low-cost depositing α-phase alumina films on high speed steel substrates as cutting tools.

alloy target hardness magnetron sputtering thin films

SCI ; EI

英语

通讯

Post-doctoral Foundation Project of Shenzhen Polytechnic[6019330010K0] ; Post-doctoral Later-stage Foundation Project of Shenzhen Polytechnic[6019271002K] ; Shenzhen Science and Technology Innovation Commission[JCYJ20170817110331228]

Materials Science

Materials Science, Multidisciplinary

WOS:000590712500001

IOP PUBLISHING LTD

20204909565324

Metastable phases ; Corundum ; Scanning electron microscopy ; Hardness ; Aluminum oxide ; Nanoparticles ; Temperature ; Transmission electron microscopy

Minerals:482.2 ; Thermodynamics:641.1 ; Nanotechnology:761 ; Physical Chemistry:801.4 ; Inorganic Compounds:804.2 ; Physical Properties of Gases, Liquids and Solids:931.2 ; Solid State Physics:933 ; Materials Science:951

2-s2.0-85096819927

Scopus

1.Institute of Intelligent Manufacturing Technology,Postdoctoral Innovation Practice Base,Shenzhen Polytechnic,Shenzhen,518055,China
2.School of Materials Science and Engineering,Southeast University,Nanjing,210096,China
3.Department of Materials Science and Engineering,Southern University of Science and Technology,Shenzhen,518055,China

Cheng，Yitian,Chu，Chenglin,Zhou，Peng. Low-temperature deposition and hardness enhancement of α-(Al,Cr)2O3films by reactive high power pulsed magnetron sputtering[J]. Materials Research Express,2020,7(11).

Cheng，Yitian,Chu，Chenglin,&Zhou，Peng.(2020).Low-temperature deposition and hardness enhancement of α-(Al,Cr)2O3films by reactive high power pulsed magnetron sputtering.Materials Research Express,7(11).

Cheng，Yitian,et al."Low-temperature deposition and hardness enhancement of α-(Al,Cr)2O3films by reactive high power pulsed magnetron sputtering".Materials Research Express 7.11(2020).