题名 | E-mode p-GaN Gate HEMT with p-FET Bridge for Higher VTHand Enhanced VTHStability |
作者 | |
通讯作者 | Hua,Mengyuan |
DOI | |
发表日期 | 2020-12-12
|
ISSN | 0163-1918
|
ISBN | 978-1-7281-8889-8
|
会议录名称 | |
卷号 | 2020-December
|
页码 | 23.1.1-23.1.4
|
会议日期 | 12-18 Dec. 2020
|
会议地点 | San Francisco, CA, USA
|
摘要 | a novel p-GaN gate topology is proposed to inherently increase threshold voltage (VTH) and enhance VTH stability. The gate consists of a conventional Schottky-type p-GaN gate and a normally-on p-channel FET bridge connecting source and gate. By modulating the VTH of the p-channel FET, a wide-range positive VTH from 3.6 V to 8.2 V can be achieved without subthreshold voltage degradation. Owing to the well-grounded p-GaN through the normally-on p-FET channel, a stable VTH is also achieved without sacrificing the low gate leakage and large gate swing enabled by the Schottky gate metal/p-GaN contact. |
关键词 | |
学校署名 | 第一
; 通讯
|
语种 | 英语
|
相关链接 | [Scopus记录] |
收录类别 | |
EI入藏号 | 20211310129592
|
EI主题词 | Gallium nitride
; III-V semiconductors
; Threshold voltage
|
EI分类号 | Electricity: Basic Concepts and Phenomena:701.1
; Semiconductor Devices and Integrated Circuits:714.2
|
Scopus记录号 | 2-s2.0-85102957357
|
来源库 | Scopus
|
全文链接 | https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=9371969 |
引用统计 |
被引频次[WOS]:18
|
成果类型 | 会议论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/221865 |
专题 | 南方科技大学 工学院_电子与电气工程系 |
作者单位 | 1.Southern University of Science and Technology,Department of EEE,Shenzhen,China 2.Peking University,Institute of Microelectronics,Beijing,China 3.The Hong Kong University of Science and Technology,Department of ECE,Hong Kong,Hong Kong |
第一作者单位 | 南方科技大学 |
通讯作者单位 | 南方科技大学 |
第一作者的第一单位 | 南方科技大学 |
推荐引用方式 GB/T 7714 |
Hua,Mengyuan,Chen,Junting,Wang,Chengcai,et al. E-mode p-GaN Gate HEMT with p-FET Bridge for Higher VTHand Enhanced VTHStability[C],2020:23.1.1-23.1.4.
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条目包含的文件 | 条目无相关文件。 |
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