纳米颗粒在紫外压印工艺优化及材料改性中的应用

APPLICATION OF NANOPARTICLES IN UV-NIL PROCESS OPTIMIZATION AND MATERIAL MODIFICATION

罗文昕

11930254

硕士

材料工程

程鑫

2021-05-19

2021-06-23

南方科技大学

深圳

材料图形化是各种器件在生产过程中制造微/纳米结构的重要过程之一，通常需要光刻技术来制作功能结构。紫外固化压印又以其高保真、低成本、高效率的优点在纳米制造技术中脱颖而出。然而在紫外固化压印技术中，由于机械压合会导致脱模困难引发转印图形缺陷率增大，通常需要在模具表面加入脱模剂，以便在模具和压印抗蚀剂之间容易脱模。本文通过探究紫外曝光剂量与压印胶固化后体积收缩变化之间的关系，对加工工艺进行优化并达到提高转印图形质量的目的。有机-无机纳米复合材料近年来的发展逐渐成熟，常被研究人员用作制备功能化材料。无机材料的优点由其自身性质决定，机械性能较强，耐热性较强等；相反地，有机材料的延展性更好，耐压力和抗冲击性能更强，同时它们的质量也普遍更低。综上所述，如果巧妙地将无机材料和有机材料组合起来，制得的多元化材料就能同时兼备这两种材料的优势。本文通过将稳定性好同时对人体和自然无公害的高折射率TiO2、ZnO纳米颗粒在紫外固化压印胶中进行直接分散改性，探究纳米颗粒的氧化物种类、粒径及纳米颗粒浓度对复合胶折射率的影响，并讨论在分散过程中是否需要加入稀释剂等其他助剂。纳米颗粒还可以用于超疏水材料的制备，降低成本并简化工艺。人类从自然界获得启发，模仿动植物自身的超疏水能力，通过各种制备手段如化学蚀刻、等离子体蚀刻、溶胶-凝胶法、电镀法和静电纺丝法制备超疏水涂层，解决现实生活中由于材料亲水所带来的各类问题。然而这些方式大多工序复杂且造价昂贵，本文通过将不同单一粒径及不同粒径组合的SiO2颗粒用含氟硅烷进行改性，通过旋涂的方法将此改性材料在硅片上制得疏水甚至超疏水涂层。

High-resolution patterning technique is one of the important processes for the fabrication of micro/nano structures in the production process of various devices, which usually requires lithography to fabricate functional structures. UV-nanoimprint lithography (UV-NIL) has the advantages of high fidelity, low cost and high efficiency in nanometer manufacturing technology. However, the mechanical pressing will lead to demolding difficulties, resulting in the transfer pattern defect in UV-NIL. People usually need to add a release agent on the mold surface, so that it is easy to demold between the mold and the imprinted resist. In this study, we focus on the understanding of the correlations among the degree of curing, the volume shrinkage of the resist, and the nano-mechanical behaviors, which may strongly impact the pattern transfer results and provide insights into the optimization of the demolding process.In recent years, organic-inorganic nanocomposites have become mature and been used by researchers to prepare functional materials. The diversified materials prepared by organic-inorganic hybrid method not only have the advantages of light weight, flexibility, impact resistance and good processing property brought by organic materials, but also have the advantages of good chemical resistance, high thermal stability and strong hardness brought by inorganic materials. Because TiO2 and ZnO nanoparticles have good stability and naturally pollution-free，we add these nanoparticles of high refractive index into the UV resist. Nanoparticles are directly dispersed to modify the UV resist. We explore the influence of the size of nanoparticles, the concentration of the nanoparticles, and the type of the oxide nanoparticles on the refractive index of the modified UV resist, and discuss whether we need to add decentralized diluents or other auxiliaries in the process.Nanoparticles can also be used in the preparation of superhydrophobic materials, reducing costs and simplifying the process. Taking inspiration from nature, humans copied the superhydrophobic abilities of plants and animals. Superhydrophobic coatings are prepared by various preparation methods such as chemical etching, plasma etching, sol-gel method, electroplating method and electrospinning to solve various problems caused by hydrophilic materials in real life. However, most of these methods are complex and expensive. In this study, SiO2 nanoparticles with different particle sizes are modified by fluorosilanes. Then the modified material is spin-coated onto the silicon wafer to get a coating. We found that these coatings are hydrophobic and/or superhydrophobic.

高折射率 紫外压印 光固化胶 超疏水涂层 纳米颗粒

high refractive index UV-NIL UV resist superhydrophobic coating nanoparticles

中文

独立培养

南方科技大学

罗文昕. 纳米颗粒在紫外压印工艺优化及材料改性中的应用[D]. 深圳. 南方科技大学,2021.