Controlling the pixel colors of quantum dot thin films by patterning the substrates

Wu，Zhenghui1; Wang，Weigao1; Ma，Jingrui1; Liu，Pai1,2; Sun，Xiao Wei1,2

10.1002/sdtp.14631

2021

0097-966X

2168-0159

Digest of Technical Papers - SID International Symposium

52

1

143-146

The common methods to achieve high resolution of patterned QD thin films are photolithography of QD thin films and ink-jet printing of QD thin films. To avoid damages on QDs caused by photolithography and further increase the resolution of the patterned QD, a new method, i.e. selective extraction of lightemission by patterning the bottom electrode instead, was developed in this work. The theory of this method is based on optical interference. Patterning the ITO substrates offers more flexibility and higher resolution, since ITO is more robust and resistive to damages related to photolithography.

Mixed quantum dots Optical interference Patterning Photolithography Selective extraction of light emission

第一 ; 通讯

英语

EI

20213510840933

Ink jet printing ; Photolithography ; Semiconductor quantum dots

Semiconductor Devices and Integrated Circuits:714.2 ; Printing:745.1

2-s2.0-85113833989

Scopus

1.Guangdong University Key Lab for Advanced Quantum Dot Displays and Lighting,Shenzhen Key Laboratory for Advanced Quantum Dot Displays and Lighting,and Department of Electrical and Electronic Engineering,Southern University of Science and Technology,Shenzhen,518055,China
2.Shenzhen Planck Innovation Technologies Pte Ltd,Longgang, Shenzhen,Huancheng South Road,518129,China

Wu，Zhenghui,Wang，Weigao,Ma，Jingrui,et al. Controlling the pixel colors of quantum dot thin films by patterning the substrates[C],2021:143-146.