题名 | Characterization of trap behaviors in AlGaN/GaN MIS-HEMT via Transient Capacitance Measurement |
作者 | |
通讯作者 | Yu, Hong-yu |
DOI | |
发表日期 | 2016
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会议录名称 | |
页码 | 1053-1055
|
会议地点 | Hangzhou, China
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出版地 | 345 E 47TH ST, NEW YORK, NY 10017 USA
|
出版者 | |
摘要 | Transient capacitance measurement is used to study the trap behaviors in AlGaN/GaN MIS-HEMTs: 1) By measuring transfer characteristics before and after the pulse cycles applied on the gate electrode in AlGaN/GaN MIS-HEMTs, the threshold voltage (V-th) instability induced by the gate pulse is investigated; 2) The change of trap density before and after step-stress applied on drain electrode is also quantitatively analyzed. |
学校署名 | 第一
; 通讯
|
语种 | 英语
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相关链接 | [来源记录] |
收录类别 | |
资助项目 | Energy-efficient Si based GaN power devices Project[KQCX20140522151322946]
|
WOS研究方向 | Engineering
|
WOS类目 | Engineering, Electrical & Electronic
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WOS记录号 | WOS:000478951000296
|
EI入藏号 | 20173604123465
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EI主题词 | Aluminum gallium nitride
; Capacitance
; Capacitance measurement
; Electrodes
; Gallium nitride
; High electron mobility transistors
; III-V semiconductors
; Integrated circuits
; Refractory metal compounds
; Threshold voltage
|
EI分类号 | Electricity: Basic Concepts and Phenomena:701.1
; Semiconductor Devices and Integrated Circuits:714.2
; Organic Compounds:804.1
; Inorganic Compounds:804.2
; Electric Variables Measurements:942.2
|
来源库 | Web of Science
|
引用统计 |
被引频次[WOS]:1
|
成果类型 | 会议论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/24872 |
专题 | 工学院_电子与电气工程系 |
作者单位 | 1.South Univ Sci & Technol China, Dept Elect & Elect Engn, Shenzhen 518055, Peoples R China 2.Enkris Semicond Inc, Suzhou 215123, Peoples R China |
第一作者单位 | 电子与电气工程系 |
通讯作者单位 | 电子与电气工程系 |
第一作者的第一单位 | 电子与电气工程系 |
推荐引用方式 GB/T 7714 |
Dong, Bin,Lin, Jie,Wang, Ning,et al. Characterization of trap behaviors in AlGaN/GaN MIS-HEMT via Transient Capacitance Measurement[C]. 345 E 47TH ST, NEW YORK, NY 10017 USA:IEEE,2016:1053-1055.
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条目包含的文件 | 条目无相关文件。 |
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