中文版 | English
题名

Study of a novel two mesas termination SiC Schottky barrier diode

作者
通讯作者Yu, Hong-Yu
DOI
发表日期
2016
ISBN
978-1-4673-9720-9
会议录名称
页码
1044-1046
会议日期
25-28 Oct. 2016
会议地点
Hangzhou, China
出版地
345 E 47TH ST, NEW YORK, NY 10017 USA
出版者
摘要
A SiC Schottky barrier diode (SBD) with a novel junction termination structure including two mesas and one P+ guard ring was proposed and demonstrated. Under reverse bias, charge will be attracted to the position of guard ring instead of concentrating at the edge of Schottky junction due to the existence of the first mesa. In addition, the second mesa will further cause the high electronic field expanding vertically, thus optimizing the electronic field region distribution. The dependence of peak electric field on mesa dimensions and guard ring are studied systematically. It was found that the peak electric field was greatly affected by the first mesa height and the guard ring concentration, while there was no obvious variation tendency between the peak electric field and the first mesa width as well as the guard ring depth. Moreover, the thickness of SiC epi-layer can be used adequately and the area of SiC epl-layer can also be reduced for fabricating the same level devices.
关键词
学校署名
第一 ; 通讯
语种
英语
相关链接[来源记录]
收录类别
资助项目
"Key technology research of GaN on Si power devices" research fund[JSGG20140729145956266]
WOS研究方向
Engineering
WOS类目
Engineering, Electrical & Electronic
WOS记录号
WOS:000478951000293
EI入藏号
20173604123462
EI主题词
Electric fields ; Integrated circuits ; Schottky barrier diodes ; Semiconductor junctions ; Silicon carbide
EI分类号
Electricity: Basic Concepts and Phenomena:701.1 ; Semiconductor Devices and Integrated Circuits:714.2 ; Inorganic Compounds:804.2
来源库
Web of Science
全文链接https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=7998645
引用统计
被引频次[WOS]:0
成果类型会议论文
条目标识符http://sustech.caswiz.com/handle/2SGJ60CL/24885
专题工学院_电子与电气工程系
作者单位
1.Southern Univ Sci & Technol, Dept Elect & Elect Engn, Shenzhen 518055, Peoples R China
2.Shenzhen Key Laborary Third Generat Semicond, Shenzhen 518055, Peoples R China
第一作者单位电子与电气工程系
通讯作者单位电子与电气工程系
第一作者的第一单位电子与电气工程系
推荐引用方式
GB/T 7714
Wang, Hui,Jiang, Ling-Li,Yu, Hong-Yu. Study of a novel two mesas termination SiC Schottky barrier diode[C]. 345 E 47TH ST, NEW YORK, NY 10017 USA:IEEE,2016:1044-1046.
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