题名 | Line Defect Detection on 2D materials with Micro Four-Point Probe Measurement |
作者 | |
通讯作者 | Gong, Xu |
DOI | |
发表日期 | 2015
|
ISSN | 2474-3747
|
EISSN | 2474-3755
|
会议录名称 | |
页码 | 589-592
|
会议地点 | Xi'an, China
|
出版地 | 345 E 47TH ST, NEW YORK, NY 10017 USA
|
出版者 | |
摘要 | This paper presents a measurement scheme which can be used to detect the line defects in two dimensional (2D) materials such as graphene. With micro four point probe measurement, the sheet resistances of the material can be mapped in two directions. Therefore, the line defects with insulation boundaries can be illustrated by calculating the resistance ratio RA/RB. We have demonstrated the simulations on 2D material with single defect and double defects with different positions and angles. The size effect of the defects has also been studied. The presented method is also promising for material characterization and defect estimation on film materials. |
关键词 | |
学校署名 | 第一
; 通讯
|
语种 | 英语
|
相关链接 | [来源记录] |
收录类别 | |
WOS研究方向 | Science & Technology - Other Topics
; Instruments & Instrumentation
|
WOS类目 | Nanoscience & Nanotechnology
; Instruments & Instrumentation
|
WOS记录号 | WOS:000380505700140
|
EI入藏号 | 20153401190172
|
EI主题词 | Probes
; Sheet resistance
|
EI分类号 | Electric Variables Measurements:942.2
; Materials Science:951
|
来源库 | Web of Science
|
引用统计 |
被引频次[WOS]:0
|
成果类型 | 会议论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/24973 |
专题 | 工学院_电子与电气工程系 |
作者单位 | 1.South Univ Sci & Technol China, Dept Elect & Elect Engn, Shenzhen, Peoples R China 2.Shenzhen Key Lab 3rd Generat Semicond Devices, Shenzhen, Peoples R China |
第一作者单位 | 电子与电气工程系 |
通讯作者单位 | 电子与电气工程系 |
第一作者的第一单位 | 电子与电气工程系 |
推荐引用方式 GB/T 7714 |
Gong, Xu,Wang, Fei,IEEE. Line Defect Detection on 2D materials with Micro Four-Point Probe Measurement[C]. 345 E 47TH ST, NEW YORK, NY 10017 USA:IEEE,2015:589-592.
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条目包含的文件 | 条目无相关文件。 |
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