题名 | Plasma treatment of p-GaN/n-ZnO light-emitting diodes |
作者 | |
通讯作者 | Leung, Yu Hang |
DOI | |
发表日期 | 2014
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ISSN | 1996756X
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EISSN | 1996-756X
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会议录名称 | |
卷号 | 8987
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会议地点 | San Francisco, CA, United states
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出版地 | 1000 20TH ST, PO BOX 10, BELLINGHAM, WA 98227-0010 USA
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出版者 | |
摘要 | Zinc oxide (ZnO) is a material of great interest for short-wavelength optoelectronic applications due to its wide band gap (3.37 eV) and high exciton binding energy (60 meV). Due to the difficulty in stable p-type doping of ZnO, other p-type materials such as gallium nitride (GaN) have been used to form heterojunctions with ZnO. p-GaN/n-ZnO heterojunction devices, in particular light-emitting diodes (LED) have been extensively studied. There was a huge variety of electronic properties and emission colors on the reported devices. It is due to the different energy alignment at the interface caused by different properties of the GaN layer and ZnO counterpart in the junction. Attempts have been made on modifying the heterojunction by various methods, such as introducing a dielectric interlayer and post-growth surface treatment, and changing the growth methods of ZnO. In this study, heterojunction LED devices with p-GaN and ZnO nanorods array are demonstrated. The ZnO nanorods were grown by a solution method. The ZnO nanorods were exposed to different kinds of plasma treatments (such as nitrogen and oxygen) after the growth. It was found that the treatment could cause significant change on the optical properties of the ZnO nanorods, as well as the electronic properties and light emissions of the resultant LED devices. |
关键词 | |
学校署名 | 其他
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语种 | 英语
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相关链接 | [来源记录] |
收录类别 | |
WOS研究方向 | Optics
; Physics
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WOS类目 | Optics
; Physics, Applied
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WOS记录号 | WOS:000337582100049
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EI入藏号 | 20142417801955
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EI主题词 | Binding energy
; Diodes
; Electronic properties
; Energy gap
; Gallium nitride
; Heterojunctions
; II-VI semiconductors
; III-V semiconductors
; Light emitting diodes
; Nanorods
; Nitrogen plasma
; Optical properties
; Plasma applications
; Semiconductor quantum wells
; Surface treatment
; Zinc oxide
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EI分类号 | Semiconductor Devices and Integrated Circuits:714.2
; Light/Optics:741.1
; Nanotechnology:761
; Physical Chemistry:801.4
; Inorganic Compounds:804.2
; Plasma Physics:932.3
; Solid State Physics:933
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来源库 | Web of Science
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引用统计 |
被引频次[WOS]:0
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成果类型 | 会议论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/25034 |
专题 | 理学院_物理系 |
作者单位 | 1.Univ Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R China 2.S Univ Sci & Technol China, Nanostruct Inst Energy & Environm Res, Div Phys Sci, Shenzhen, Peoples R China 3.Univ Hong Kong, Dept Chem, Hong Kong, Peoples R China 4.Hong Kong Polytechn Univ, Dept Elect & Informat Engn, Kowloon, Hong Kong, Peoples R China |
推荐引用方式 GB/T 7714 |
Leung, Yu Hang,Ng, Alan M. C.,Djurisic, Aleksandra B.,et al. Plasma treatment of p-GaN/n-ZnO light-emitting diodes[C]. 1000 20TH ST, PO BOX 10, BELLINGHAM, WA 98227-0010 USA:SPIE-INT SOC OPTICAL ENGINEERING,2014.
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条目包含的文件 | 条目无相关文件。 |
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