Nanohole Structure as Efficient Antireflection Layer for Silicon Solar Cell Fabricated by Maskless Laser Annealing

Hong, Lei1; Rusli1; Wang, Fei1; He, Lining1; Wang, Xincai2; Zheng, Hongyu2; Wang, Hao1; Yu, HongYu3

10.1109/PVSC.2012.6317965

2012

0160-8371

2012 38TH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE (PVSC)

1904-1907

Austin, TX, United states

345 E 47TH ST, NEW YORK, NY 10017 USA

IEEE

In this paper, a uniform nanohole structure on silicon wafer is fabricated using the silver catalyst induced method. The optical properties of the silicon nanohole structure are studied systematically at different nanohole depths. The nanohole arrays demonstrate excellent antireflection property due to its sub-wavelength structure with a low reflection loss of 4% for incident light within the wavelength range of 300-1100 nm. The angular dependence of reflectivity is also investigated. The average reflection decreases at first and then increases as the incident light deviated from normal, with a very lower reflectivity of 0.83 % at an incident angle of 20 degrees. The suppressed reflection indicates a strong light trapping ability of the nanohole structure, and provides a low cost method to enhance light absorption and performance for the solar cell application.

nanoparticles nanostructures photovoltaic cells silicon

其他

英语

CPCI-S ; EI

Energy & Fuels ; Engineering ; Physics

Energy & Fuels ; Engineering, Electrical & Electronic ; Physics, Applied

WOS:000309917802041

20124815703518

Catalysts ; Fabrication ; Light absorption ; Light reflection ; Nanoparticles ; Nanostructures ; Optical properties ; Photoelectrochemical cells ; Photovoltaic cells ; Silicon ; Silicon wafers

Nonferrous Metals and Alloys excluding Alkali and Alkaline Earth Metals:549.3 ; Electric Batteries:702.1 ; Solar Cells:702.3 ; Semiconductor Devices and Integrated Circuits:714.2 ; Light/Optics:741.1 ; Nanotechnology:761 ; Chemical Agents and Basic Industrial Chemicals:803 ; Chemical Products Generally:804 ; Solid State Physics:933

Web of Science

1.Nanyang Technol Univ, Sch Elect & Elect Engn, 50 Nanyang Ave, Singapore 639798, Singapore
2.ASTAR, Singapore Inst Manufacturing Technol, Singapore 638075, Singapore
3.South Univ Sci & Technol China, Shenzhen, Peoples R China

Hong, Lei,Rusli,Wang, Fei,et al. Nanohole Structure as Efficient Antireflection Layer for Silicon Solar Cell Fabricated by Maskless Laser Annealing[C]. 345 E 47TH ST, NEW YORK, NY 10017 USA:IEEE,2012:1904-1907.