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题名

Dimensional Crossover and Topological Nature of the Thin Films of a Three-Dimensional Topological Insulator by Band Gap Engineering

作者
通讯作者Wang, Zhenyu; Liu, Qihang; Chen, Chaoyu
发表日期
2019-07
DOI
发表期刊
ISSN
1530-6984
EISSN
1530-6992
卷号19期号:7页码:4627-4633
摘要
Identification and control of topological phases in topological thin films offer great opportunities for fundamental research and the fabrication of topology-based devices. Here, combining molecular beam epitaxy, angle-resolved photoemission spectroscopy, and ab initio calculations, we investigate the electronic structure evolution in (Bi1-xInx)(2)Se-3 films (0 <= x <= 1) with thickness from 2 to 13 quintuple layers. By employing both thickness and In substitution as two independent "knobs" to control the gap change, we identify the evolution between several topological phases, i.e., dimensional crossover from a three-dimensional topological insulator to its two-dimensional counterpart with gapped surface state, and topological phase transition from a topological insulator to a normal semiconductor with increasing In concentration. Furthermore, by introducing In substitution, we experimentally demonstrated the trivial topological nature of Bi2Se3 thin films (below 6 quintuple layers) as two-dimensional gapped systems, consistent with our theoretical calculations. Our results provide not only a comprehensive phase diagram of (Bi1-xInx)(2)Se-3 and a route to control its phase evolution but also a practical way to experimentally determine the topological properties of a gapped compound by a topological phase transition and band gap engineering.
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相关链接[来源记录]
收录类别
SCI ; EI
语种
英语
重要成果
NI论文
学校署名
通讯
资助项目
Science, Technology and Innovation Commission of Shenzhen Municipality[ZDSYS20170303165926217] ; Science, Technology and Innovation Commission of Shenzhen Municipality[JCYJ20170412152620376]
WOS研究方向
Chemistry ; Science & Technology - Other Topics ; Materials Science ; Physics
WOS类目
Chemistry, Multidisciplinary ; Chemistry, Physical ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied ; Physics, Condensed Matter
WOS记录号
WOS:000475533900054
出版者
EI入藏号
20192607115524
EI主题词
Bismuth compounds ; Calculations ; Density functional theory ; Electric insulators ; Electronic structure ; Energy gap ; Molecular beam epitaxy ; Phase diagrams ; Photoelectron spectroscopy ; Selenium compounds ; Thin films ; Topological insulators
EI分类号
Mathematics:921 ; Combinatorial Mathematics, Includes Graph Theory, Set Theory:921.4 ; Probability Theory:922.1 ; Atomic and Molecular Physics:931.3
ESI学科分类
MATERIALS SCIENCE
来源库
Web of Science
引用统计
被引频次[WOS]:21
成果类型期刊论文
条目标识符http://sustech.caswiz.com/handle/2SGJ60CL/25607
专题量子科学与工程研究院
理学院_物理系
作者单位
1.Natl Univ Def Technol, Coll Comp, State Key Lab High Performance Comp, Changsha 410073, Hunan, Peoples R China
2.Acad Mil Sci PLA China, Natl Innovat Inst Def Technol, Beijing 100010, Peoples R China
3.Tsinghua Univ, Dept Phys, State Key Lab Low Dimens Quantum Phys, Beijing 100084, Peoples R China
4.Southern Univ Sci & Technol SUSTech, Shenzhen Inst Quantum Sci & Engn SIQSE, Shenzhen 518055, Peoples R China
5.Southern Univ Sci & Technol SUSTech, Dept Phys, Shenzhen 518055, Peoples R China
6.Natl Univ Def Technol, Coll Adv Interdisciplinary Studies, Changsha 410073, Hunan, Peoples R China
7.Beijing Acad Quantum Informat Sci, Beijing 100084, Peoples R China
8.Ctr Quantum Comp, Peng Cheng Lab, Shenzhen 518055, Peoples R China
9.Southeast Univ, Sch Phys, Nanjing 211189, Jiangsu, Peoples R China
通讯作者单位量子科学与工程研究院;  物理系
推荐引用方式
GB/T 7714
Wang, Zhenyu,Zhou, Tong,Jiang, Tian,et al. Dimensional Crossover and Topological Nature of the Thin Films of a Three-Dimensional Topological Insulator by Band Gap Engineering[J]. NANO LETTERS,2019,19(7):4627-4633.
APA
Wang, Zhenyu.,Zhou, Tong.,Jiang, Tian.,Sun, Hongyi.,Zang, Yunyi.,...&Xue, Qi-Kun.(2019).Dimensional Crossover and Topological Nature of the Thin Films of a Three-Dimensional Topological Insulator by Band Gap Engineering.NANO LETTERS,19(7),4627-4633.
MLA
Wang, Zhenyu,et al."Dimensional Crossover and Topological Nature of the Thin Films of a Three-Dimensional Topological Insulator by Band Gap Engineering".NANO LETTERS 19.7(2019):4627-4633.
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