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题名

Chemical Growth of 1T-TaS2 Monolayer and Thin Films: Robust Charge Density Wave Transitions and High Bolometric Responsivity

作者
通讯作者Xie, Liming
发表日期
2018-09-20
DOI
发表期刊
ISSN
0935-9648
EISSN
1521-4095
卷号30期号:38
摘要

Ultrathin two-dimensional (2D) charge density wave (CDW) materials, with sharp resistance change at the phase-transition temperature, yet with ultrathin thickness, hold great potential for electrical device applications. However, chemical synthesis of high-quality samples and observation of the CDW states down to the monolayer limit is still of great challenge. Chemical vapor deposition of 1T-TaS2 sheets on hexagonal boron nitride (h-BN) with robust CDW states even down to the monolayer extreme is reported here. Further, based on the near commensurate CDW to incommensurate CDW phase transition with a high temperature coefficient of resistance (TCR), highly responsive room-temperature bolometers are fabricated by suspending the as-grown 1T-TaS2 sheets.

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相关链接[来源记录]
收录类别
SCI ; EI
语种
英语
重要成果
NI期刊
学校署名
其他
资助项目
JSPS KAKENHI[JP16H06333] ; JSPS KAKENHI[P16823]
WOS研究方向
Chemistry ; Science & Technology - Other Topics ; Materials Science ; Physics
WOS类目
Chemistry, Multidisciplinary ; Chemistry, Physical ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied ; Physics, Condensed Matter
WOS记录号
WOS:000444671900004
出版者
ESI学科分类
MATERIALS SCIENCE
来源库
Web of Science
引用统计
被引频次[WOS]:73
成果类型期刊论文
条目标识符http://sustech.caswiz.com/handle/2SGJ60CL/27220
专题理学院_物理系
作者单位
1.Natl Ctr Nanosci & Technol, CAS Key Lab Stand & Measurement Nanotechnol, CAS Ctr Excellence Nanosci, Beijing 100190, Peoples R China
2.Univ Chinese Acad Sci, Beijing 100049, Peoples R China
3.Natl Inst Adv Ind Sci & Technol, Tsukuba, Ibaraki 3058565, Japan
4.Natl Ctr Nanosci & Technol, CAS Key Lab Nanosyst & Hierarch Fabricat, CAS Ctr Excellence Nanosci, Beijing 100190, Peoples R China
5.Southern Univ Sci & Technol, Dept Phys, Shenzhen 518055, Peoples R China
推荐引用方式
GB/T 7714
Wang, Xinsheng,Liu, Haining,Wu, Juanxia,et al. Chemical Growth of 1T-TaS2 Monolayer and Thin Films: Robust Charge Density Wave Transitions and High Bolometric Responsivity[J]. ADVANCED MATERIALS,2018,30(38).
APA
Wang, Xinsheng.,Liu, Haining.,Wu, Juanxia.,Lin, Junhao.,He, Wen.,...&Xie, Liming.(2018).Chemical Growth of 1T-TaS2 Monolayer and Thin Films: Robust Charge Density Wave Transitions and High Bolometric Responsivity.ADVANCED MATERIALS,30(38).
MLA
Wang, Xinsheng,et al."Chemical Growth of 1T-TaS2 Monolayer and Thin Films: Robust Charge Density Wave Transitions and High Bolometric Responsivity".ADVANCED MATERIALS 30.38(2018).
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adma.201800074.pdf(2399KB)----限制开放--
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