题名 | Effective atomic interface engineering in Bi2Te2.7Se0.3 thermoelectric material by atomic-layer-deposition approach |
作者 | |
通讯作者 | Pan, Feng |
发表日期 | 2018-07
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DOI | |
发表期刊 | |
ISSN | 2211-2855
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EISSN | 2211-3282
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卷号 | 49页码:257-266 |
摘要 | Grain boundaries play a critical role in the carrier/phonon transport in thermoelectric materials. It remains a big challenge to control over both chemical composition and dimension of grain boundary precisely by traditional approaches. Herein, an bottom-up grain boundary engineering strategy based on atomic layer deposition (ALD) is first introduced to atomically control and modify the grain boundary of Bi2Te3-based thermoelectric materials. To demonstrate the effect of this strategy, ultrathin ZnO interlayer is deposited on the Bi2Te2.7Se0.3 (BTS) grain boundaries to optimize of the carrier/phonon transport for achieving high thermoelectric performance. In situ TEM experiments upon heating reveals that the ZnO interlayer will give rise to the precipitation of Te nanodot at ZnO/BTS interface, which can be atomically controlled by adjusting the thickness of ZnO layer. Benefited from the atomically precise modified grain boundary, a maximum ZT of 0.85 is obtained, approximately 1.8 times higher than that of the pure BTS. As a powerful interfacial modification strategy, ALD-based approach can be extended to other thermoelectric material system simply, which may contribute to the development of high performance thermoelectric material of great significance. |
关键词 | |
相关链接 | [来源记录] |
收录类别 | |
语种 | 英语
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学校署名 | 其他
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资助项目 | National Natural Science Foundation of China[51602143]
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WOS研究方向 | Chemistry
; Science & Technology - Other Topics
; Materials Science
; Physics
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WOS类目 | Chemistry, Physical
; Nanoscience & Nanotechnology
; Materials Science, Multidisciplinary
; Physics, Applied
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WOS记录号 | WOS:000434829500031
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出版者 | |
EI入藏号 | 20181805131692
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EI主题词 | Atoms
; Bismuth compounds
; Grain boundaries
; II-VI semiconductors
; Nanocomposites
; Selenium compounds
; Thermoelectric equipment
; Thermoelectricity
; Zinc oxide
|
EI分类号 | Thermoelectric Energy:615.4
; Electricity: Basic Concepts and Phenomena:701.1
; Nanotechnology:761
; Inorganic Compounds:804.2
; Atomic and Molecular Physics:931.3
; Solid State Physics:933
; Crystal Growth:933.1.2
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来源库 | Web of Science
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引用统计 |
被引频次[WOS]:57
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成果类型 | 期刊论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/27552 |
专题 | 理学院_物理系 |
作者单位 | 1.Peking Univ, Shenzhen Grad Sch, Sch Adv Mat, Shenzhen 518055, Peoples R China 2.Shenzhen Univ, Coll Mat Sci & Engn, Shenzhen 518060, Peoples R China 3.Shenzhen Key Lab Special Funct Mat, Shenzhen 518060, Peoples R China 4.South Univ Sci & Technol China, Dept Phys, Shenzhen 518055, Peoples R China 5.Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200444, Peoples R China |
推荐引用方式 GB/T 7714 |
Li, Shuankui,Liu, Yidong,Liu, Fusheng,et al. Effective atomic interface engineering in Bi2Te2.7Se0.3 thermoelectric material by atomic-layer-deposition approach[J]. Nano Energy,2018,49:257-266.
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APA |
Li, Shuankui.,Liu, Yidong.,Liu, Fusheng.,He, Dongsheng.,He, Jiaqing.,...&Pan, Feng.(2018).Effective atomic interface engineering in Bi2Te2.7Se0.3 thermoelectric material by atomic-layer-deposition approach.Nano Energy,49,257-266.
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MLA |
Li, Shuankui,et al."Effective atomic interface engineering in Bi2Te2.7Se0.3 thermoelectric material by atomic-layer-deposition approach".Nano Energy 49(2018):257-266.
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文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | 操作 | |
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