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题名

Third Harmonic Generation Enhanced by Multipolar Interference in Complementary Silicon Metasurfaces

作者
通讯作者Li, Guixin; Neshev, Dragomir; Zhang, Shuang
发表日期
2018-05
DOI
发表期刊
ISSN
2330-4022
卷号5期号:5页码:1671-1675
摘要
Nonlinear harmonic generation in metasurfaces has shown great promise for applications such as novel light sources, nonlinear holography, and nonlinear imaging. In particular, dielectric metasurfaces have shown multifold enhancement of the harmonic efficiency in comparison to their plasmonic counterparts due to lower optical loss and much higher damage threshold. In this work, we propose to enhance the efficiency of the third harmonic generation in a complementary silicon nonlinear metasurface, consisting of nanoapertures of cross like shape in the silicon film. The efficiency enhancement is based on a multipolar interference between the magnetic dipole and electric quadrupole, resulting in significant near-field enhancement and a large mode volume of the nonlinear interaction. The measured efficiency of third harmonic generation from the silicon metasurface is 100x higher than that from a planar silicon film of the same thickness. Numerical analysis of the near-field resonant modes confirms the multipolar mechanism of nonlinear enhancement. Enhanced third harmonic generation by multipolar interference in complementary dielectric nanostructure opens a new route for developing high-efficiency nonlinear metasurfaces.
关键词
相关链接[来源记录]
收录类别
SCI ; EI
语种
英语
学校署名
通讯
资助项目
National Natural Science Foundation of China[11774145]
WOS研究方向
Science & Technology - Other Topics ; Materials Science ; Optics ; Physics
WOS类目
Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Optics ; Physics, Applied ; Physics, Condensed Matter
WOS记录号
WOS:000432751800007
出版者
EI入藏号
20182105230285
EI主题词
Efficiency ; Harmonic analysis ; Light sources ; Metallic films ; Nonlinear optics ; Plasmonics ; Silicon photonics ; Waveguides
EI分类号
Waveguides:714.3 ; Nonlinear Optics:741.1.1 ; Production Engineering:913.1 ; Numerical Methods:921.6
来源库
Web of Science
引用统计
被引频次[WOS]:52
成果类型期刊论文
条目标识符http://sustech.caswiz.com/handle/2SGJ60CL/27771
专题工学院_材料科学与工程系
量子科学与工程研究院
作者单位
1.Univ Birmingham, Sch Phys & Astron, Birmingham B15 2TT, W Midlands, England
2.Australian Natl Univ, Res Sch Phys & Engn, Nonlinear Phys Ctr, Canberra, ACT 2601, Australia
3.Southern Univ Sci & Technol, Dept Mat Sci & Engn, Shenzhen 518055, Peoples R China
4.Univ New South Wales Canberra, Sch Engn & Informat Technol, Northcott Dr, Campbell, ACT 2600, Australia
5.Univ Paderborn, Dept Phys, Warburger Str 100, D-33098 Paderborn, Germany
6.Southern Univ Sci & Technol, Shenzhen Inst Quantum Sci & Engn, Shenzhen 518055, Peoples R China
通讯作者单位材料科学与工程系;  量子科学与工程研究院
推荐引用方式
GB/T 7714
Chen, Shumei,Rahmani, Mohsen,Li, King Fai,et al. Third Harmonic Generation Enhanced by Multipolar Interference in Complementary Silicon Metasurfaces[J]. ACS Photonics,2018,5(5):1671-1675.
APA
Chen, Shumei.,Rahmani, Mohsen.,Li, King Fai.,Miroshnichenko, Andrey.,Zentgraf, Thomas.,...&Zhang, Shuang.(2018).Third Harmonic Generation Enhanced by Multipolar Interference in Complementary Silicon Metasurfaces.ACS Photonics,5(5),1671-1675.
MLA
Chen, Shumei,et al."Third Harmonic Generation Enhanced by Multipolar Interference in Complementary Silicon Metasurfaces".ACS Photonics 5.5(2018):1671-1675.
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