题名 | Third Harmonic Generation Enhanced by Multipolar Interference in Complementary Silicon Metasurfaces |
作者 | |
通讯作者 | Li, Guixin; Neshev, Dragomir; Zhang, Shuang |
发表日期 | 2018-05
|
DOI | |
发表期刊 | |
ISSN | 2330-4022
|
卷号 | 5期号:5页码:1671-1675 |
摘要 | Nonlinear harmonic generation in metasurfaces has shown great promise for applications such as novel light sources, nonlinear holography, and nonlinear imaging. In particular, dielectric metasurfaces have shown multifold enhancement of the harmonic efficiency in comparison to their plasmonic counterparts due to lower optical loss and much higher damage threshold. In this work, we propose to enhance the efficiency of the third harmonic generation in a complementary silicon nonlinear metasurface, consisting of nanoapertures of cross like shape in the silicon film. The efficiency enhancement is based on a multipolar interference between the magnetic dipole and electric quadrupole, resulting in significant near-field enhancement and a large mode volume of the nonlinear interaction. The measured efficiency of third harmonic generation from the silicon metasurface is 100x higher than that from a planar silicon film of the same thickness. Numerical analysis of the near-field resonant modes confirms the multipolar mechanism of nonlinear enhancement. Enhanced third harmonic generation by multipolar interference in complementary dielectric nanostructure opens a new route for developing high-efficiency nonlinear metasurfaces. |
关键词 | |
相关链接 | [来源记录] |
收录类别 | |
语种 | 英语
|
学校署名 | 通讯
|
资助项目 | National Natural Science Foundation of China[11774145]
|
WOS研究方向 | Science & Technology - Other Topics
; Materials Science
; Optics
; Physics
|
WOS类目 | Nanoscience & Nanotechnology
; Materials Science, Multidisciplinary
; Optics
; Physics, Applied
; Physics, Condensed Matter
|
WOS记录号 | WOS:000432751800007
|
出版者 | |
EI入藏号 | 20182105230285
|
EI主题词 | Efficiency
; Harmonic analysis
; Light sources
; Metallic films
; Nonlinear optics
; Plasmonics
; Silicon photonics
; Waveguides
|
EI分类号 | Waveguides:714.3
; Nonlinear Optics:741.1.1
; Production Engineering:913.1
; Numerical Methods:921.6
|
来源库 | Web of Science
|
引用统计 |
被引频次[WOS]:52
|
成果类型 | 期刊论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/27771 |
专题 | 工学院_材料科学与工程系 量子科学与工程研究院 |
作者单位 | 1.Univ Birmingham, Sch Phys & Astron, Birmingham B15 2TT, W Midlands, England 2.Australian Natl Univ, Res Sch Phys & Engn, Nonlinear Phys Ctr, Canberra, ACT 2601, Australia 3.Southern Univ Sci & Technol, Dept Mat Sci & Engn, Shenzhen 518055, Peoples R China 4.Univ New South Wales Canberra, Sch Engn & Informat Technol, Northcott Dr, Campbell, ACT 2600, Australia 5.Univ Paderborn, Dept Phys, Warburger Str 100, D-33098 Paderborn, Germany 6.Southern Univ Sci & Technol, Shenzhen Inst Quantum Sci & Engn, Shenzhen 518055, Peoples R China |
通讯作者单位 | 材料科学与工程系; 量子科学与工程研究院 |
推荐引用方式 GB/T 7714 |
Chen, Shumei,Rahmani, Mohsen,Li, King Fai,et al. Third Harmonic Generation Enhanced by Multipolar Interference in Complementary Silicon Metasurfaces[J]. ACS Photonics,2018,5(5):1671-1675.
|
APA |
Chen, Shumei.,Rahmani, Mohsen.,Li, King Fai.,Miroshnichenko, Andrey.,Zentgraf, Thomas.,...&Zhang, Shuang.(2018).Third Harmonic Generation Enhanced by Multipolar Interference in Complementary Silicon Metasurfaces.ACS Photonics,5(5),1671-1675.
|
MLA |
Chen, Shumei,et al."Third Harmonic Generation Enhanced by Multipolar Interference in Complementary Silicon Metasurfaces".ACS Photonics 5.5(2018):1671-1675.
|
条目包含的文件 | ||||||
文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | 操作 | |
Chen-2018-Third Harm(2348KB) | -- | -- | 限制开放 | -- |
|
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。
修改评论