题名 | Coalescence kinetics and microstructure evolution of Cu nanoparticles sintering on substrates: a molecular dynamics study |
作者 | |
通讯作者 | Ye,Huaiyu |
发表日期 | 2022-03-01
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DOI | |
发表期刊 | |
ISSN | 2238-7854
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EISSN | 2214-0697
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卷号 | 17页码:1132-1145 |
摘要 | Nano copper sintering technology has great potential to be widely applied in the wide-bandgap semiconductor packaging. In order to investigate the coalescence kinetics of copper nano particles for this application, a molecular dynamic (MD) simulation was carried out at low temperature on a special model containing two substrate and multiple particles in between. Accordingly, thorough microstructure and dislocation investigation was conducted to identify the atomic-scale evolution in the system. The corresponding findings could provide evidence on the new particle-substrate sintering mechanism. Furthermore, atomic trajectories tracking method was applied to study the rotation behavior of different sized nano particles. New rotation behavior and mechanism were described. Additionally, the study on the size effect of copper particles on the sintering process and coalescence mechanism was conducted via comparing the microstructural and dislocation distribution of 3 nm, 4 nm and 5 nm models. Finally, by comparing the MSD results at low and high temperature for each model, the dominant coalescence dynamics changes were obtained. |
关键词 | |
相关链接 | [Scopus记录] |
收录类别 | |
语种 | 英语
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学校署名 | 通讯
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资助项目 | National Key R&D Program of China[2018YFE0204600]
; Shenzhen Fundamental Research Program[JCYJ20200109140822796]
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WOS研究方向 | Materials Science
; Metallurgy & Metallurgical Engineering
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WOS类目 | Materials Science, Multidisciplinary
; Metallurgy & Metallurgical Engineering
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WOS记录号 | WOS:000796950400004
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出版者 | |
EI入藏号 | 20220511567433
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EI主题词 | Coalescence
; Copper
; Molecular dynamics
; Nanoparticles
; Particle size analysis
; Rotation
; Sintering
; Temperature
; Wide band gap semiconductors
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EI分类号 | Copper:544.1
; Thermodynamics:641.1
; Semiconducting Materials:712.1
; Nanotechnology:761
; Colloid Chemistry:801.3
; Physical Chemistry:801.4
; Mechanics:931.1
; Solid State Physics:933
; Materials Science:951
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Scopus记录号 | 2-s2.0-85123714426
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来源库 | Scopus
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引用统计 |
被引频次[WOS]:12
|
成果类型 | 期刊论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/277828 |
专题 | 工学院_深港微电子学院 |
作者单位 | 1.Department of Microelectronics,Delft University of Technology,Delft,2628 CD,Netherlands 2.School of Microelectronics,Southern University of Science and Technology,Shenzhen,518055,China 3.The Key Laboratory of Optoelectronic Technology & Systems,College of Optoelectronic Engineering,Education Ministry of China,Chongqing University,Chongqing,400044,China 4.School of Materials Science and Chemical Engineering,Harbin University of Science and Technology,Harbin,150040,China |
第一作者单位 | 深港微电子学院 |
通讯作者单位 | 深港微电子学院 |
推荐引用方式 GB/T 7714 |
Liu,Xu,Li,Shizhen,Tan,Chunjian,et al. Coalescence kinetics and microstructure evolution of Cu nanoparticles sintering on substrates: a molecular dynamics study[J]. Journal of Materials Research and Technology-JMR&T,2022,17:1132-1145.
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APA |
Liu,Xu.,Li,Shizhen.,Tan,Chunjian.,Gao,Chenshan.,Liu,Yang.,...&Zhang,Guoqi.(2022).Coalescence kinetics and microstructure evolution of Cu nanoparticles sintering on substrates: a molecular dynamics study.Journal of Materials Research and Technology-JMR&T,17,1132-1145.
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MLA |
Liu,Xu,et al."Coalescence kinetics and microstructure evolution of Cu nanoparticles sintering on substrates: a molecular dynamics study".Journal of Materials Research and Technology-JMR&T 17(2022):1132-1145.
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