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题名

Role of fluttering dislocations in the thermal interface resistance between a silicon crystal and plastic solid He-4

作者
通讯作者Amrit, Jay
发表日期
2018-01-22
DOI
发表期刊
ISSN
2469-9950
EISSN
2469-9969
卷号97期号:1
摘要
A quantum solid (solid He-4) in contact with a classical solid defines a new class of interfaces. In addition to its quantum nature, solid He-4 is indeed a very plastic medium. We examine the thermal interface resistance upon solidification of superfluid He-4 in contact with a silicon crystal surface (111) and show that dislocations play a crucial role in the thermal interface transport. The growth of solid He-4 and the measurements are conducted at the minimum of the melting curve of helium (0.778 K and similar to 25 bar). The results display a first-order transition in the Kapitza resistance from a value of R-K,R- L = (80 +/- 8) cm(2)K/W at a pressure of 24.5 bar to a value of R-K,R- S = (41.7 +/- 8) cm(2)K/W after the formation of solid helium at similar to 25.2 bar. The drop in R-K,R- S is only of a factor of similar to 2, although transverse phonon modes in solid He-4 now participate in heat transmission at the interface. We provide an explanation for the measured R-K,R- S by considering the interaction of thermal phonons with vibrating dislocations in solid He-4. We demonstrate that this mechanism, also called fluttering, induces a thermal resistance R-Fl alpha NdT-6, where T is the temperature and N-d is the density of dislocations. We estimate that for dislocation densities on the order of similar to 10(7)cm(-) (2), R-Fl predominates over the boundary resistance R-K,R- S. These fundamental findings shed light on the role of dislocations and provide a quantitative explanation for previous experiments which showed no measurable change in the Kapitza resistance between Cu and superfluid He-4 upon solidification of the latter. This demonstrates the possibility of using dislocations as an additional means to tailor thermal resistances at interfaces, formed especially with a plastic material.
相关链接[来源记录]
收录类别
SCI ; EI
语种
英语
学校署名
其他
资助项目
LabeX LaSIPS[ANR-10-LABX-0040-LaSIPS] ; LabeX LaSIPS[ANR-11-IDEX-0003-02]
WOS研究方向
Materials Science ; Physics
WOS类目
Materials Science, Multidisciplinary ; Physics, Applied ; Physics, Condensed Matter
WOS记录号
WOS:000423340100003
出版者
ESI学科分类
PHYSICS
来源库
Web of Science
引用统计
被引频次[WOS]:7
成果类型期刊论文
条目标识符http://sustech.caswiz.com/handle/2SGJ60CL/28137
专题理学院_物理系
作者单位
1.Univ Paris 11, Univ Paris Saclay, CNRS, Lab Informat Mecan & Sci Ingenieur, Rue John von Neumann, F-91405 Orsay, France
2.Univ Tokyo, Inst Ind Sci, CNRS, Lab Integrated Micro Mechatron Syst, Tokyo 1538505, Japan
3.South Univ Sci & Technol China, Dept Phys, Shenzhen 518055, Peoples R China
推荐引用方式
GB/T 7714
Amrit, Jay,Ramiere, Aymeric,Volz, Sebastian. Role of fluttering dislocations in the thermal interface resistance between a silicon crystal and plastic solid He-4[J]. PHYSICAL REVIEW B,2018,97(1).
APA
Amrit, Jay,Ramiere, Aymeric,&Volz, Sebastian.(2018).Role of fluttering dislocations in the thermal interface resistance between a silicon crystal and plastic solid He-4.PHYSICAL REVIEW B,97(1).
MLA
Amrit, Jay,et al."Role of fluttering dislocations in the thermal interface resistance between a silicon crystal and plastic solid He-4".PHYSICAL REVIEW B 97.1(2018).
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