题名 | Selective wetting/dewetting for controllable patterning of liquid metal electrodes for all-printed device application |
作者 | |
通讯作者 | Chen, Shuming |
发表日期 | 2017-12-21
|
DOI | |
发表期刊 | |
ISSN | 2050-7526
|
EISSN | 2050-7534
|
卷号 | 5期号:47页码:12378-12383 |
摘要 | Liquid metals based on eutectic gallium-indium (EGaIn) alloys are promising printable electrode materials for various printed devices such as light-emitting diodes or solar cells. To achieve a controllable and fine patterning of the EGaIn electrodes, herein, a facile bottom-up, additive technique has been developed by manipulating wetting/dewetting of the substrate. The substrate is first dewetted by coating a hydrophobic layer; then, to selectively dewet the substrate, the coated hydrophobic layer is patterned by laser ablation. EGaIn, which is painted onto the substrate, can only adhere to the wetting regions and thus can perfectly copy the patterns of the wetting regions. Via this method, high-resolution EGaIn patterns with a line width smaller than 100 mm can be obtained. Using the patterned EGaIn electrodes, all-printed quantum dot light-emitting diodes were successfully demonstrated. The proposed method offers a feasible route for fast patterning of EGaIn and thus allows for inexpensive, rapid fabrication of various devices without the need of costly vacuum processing. |
相关链接 | [来源记录] |
收录类别 | |
语种 | 英语
|
学校署名 | 第一
; 通讯
|
资助项目 | Shenzhen Peacock Plan[KQTD2015071710313656]
|
WOS研究方向 | Materials Science
; Physics
|
WOS类目 | Materials Science, Multidisciplinary
; Physics, Applied
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WOS记录号 | WOS:000417284100010
|
出版者 | |
EI入藏号 | 20175104560611
|
EI主题词 | Electrodes
; Hydrophobicity
; Indium Alloys
; Laser Ablation
; Liquid Metals
; Organic Light Emitting Diodes (Oled)
; Semiconductor Quantum Dots
|
EI分类号 | Metallurgy:531.1
; Nonferrous Metals And Alloys Excluding Alkali And Alkaline Earth Metals:549.3
; Heat Transfer:641.2
; Semiconductor Devices And Integrated Circuits:714.2
; Physical Properties Of Gases, Liquids And Solids:931.2
|
来源库 | Web of Science
|
引用统计 |
被引频次[WOS]:53
|
成果类型 | 期刊论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/28326 |
专题 | 工学院_电子与电气工程系 |
作者单位 | 1.Southern Univ Sci & Technol, Dept Elect & Elect Engn, Shenzhen 518055, Peoples R China 2.Hong Kong Univ Sci & Technol, State Key Lab Adv Displays & Optoelect, Kowloon, Hong Kong, Peoples R China 3.Sun Yat Sen Univ, Sch Mat Sci & Engn, State Key Lab Optoelect Mat & Technol, Guangzhou 510275, Guangdong, Peoples R China |
第一作者单位 | 电子与电气工程系 |
通讯作者单位 | 电子与电气工程系 |
第一作者的第一单位 | 电子与电气工程系 |
推荐引用方式 GB/T 7714 |
Jiang, Yibin,Su, Sikai,Peng, Huiren,et al. Selective wetting/dewetting for controllable patterning of liquid metal electrodes for all-printed device application[J]. Journal of Materials Chemistry C,2017,5(47):12378-12383.
|
APA |
Jiang, Yibin,Su, Sikai,Peng, Huiren,Kwok, Hoi Sing,Zhou, Xiang,&Chen, Shuming.(2017).Selective wetting/dewetting for controllable patterning of liquid metal electrodes for all-printed device application.Journal of Materials Chemistry C,5(47),12378-12383.
|
MLA |
Jiang, Yibin,et al."Selective wetting/dewetting for controllable patterning of liquid metal electrodes for all-printed device application".Journal of Materials Chemistry C 5.47(2017):12378-12383.
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条目包含的文件 | ||||||
文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | 操作 | |
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