题名 | Enhanced performance of an AlGaN-based deep ultraviolet light-emitting diode using a p+-GaN/SiO2/ITO tunnel junction |
作者 | |
发表日期 | 2022-02-15
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DOI | |
发表期刊 | |
ISSN | 0146-9592
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EISSN | 1539-4794
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卷号 | 47期号:4页码:798-801 |
摘要 | In this work, a 280-nm-wavelength deep-ultraviolet light-emitting diode (DUV LED) with a p-GaN/SiO/ITO tunnel junction is fabricated and investigated. Due to the decreased tunnel region width and enhanced electric field intensity in the 1-nm-thick SiO layer, the interband tunneling efficiency and the corresponding hole injection efficiency are promoted. Therefore, the external quantum efficiency (EQE) for the proposed device is increased when compared with a traditional DUV LED. In addition, an improved current spreading effect is observed for our proposed device. As a result, improved wall-plug efficiency (WPE) is obtained owing to the increased optical power and decreased forward operating voltage. Meanwhile, the enhanced electric field intensity in the SiO layer reduces the voltage drop in the p-n junction region for the proposed device, and thus the leakage current is reduced. |
相关链接 | [Scopus记录] |
收录类别 | |
语种 | 英语
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学校署名 | 其他
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资助项目 | National Natural Science Foundation of China[62074050]
; Natural Science Foundation of Hebei Province["F2018202080","F2020202030"]
; State Key Laboratory of Reliability and Intelligence of Electrical Equipment, Hebei University of Technology[EERI_PI2020008]
; Jiangsu Provincial Key Laboratory of Photonic and Electronic Materials Sciences and Technology, Nanjing University[njuzds2021-005]
; Basic and Applied Basic Research Foundation of Guangdong Province[2019A1515111053]
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WOS研究方向 | Optics
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WOS类目 | Optics
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WOS记录号 | WOS:000756709400017
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出版者 | |
EI入藏号 | 20220611608138
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EI主题词 | Aluminum gallium nitride
; Efficiency
; Electric fields
; Gallium nitride
; Light emitting diodes
; Silica
; Silicon
; Tunnel junctions
; Ultraviolet radiation
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EI分类号 | Nonferrous Metals and Alloys excluding Alkali and Alkaline Earth Metals:549.3
; Electricity: Basic Concepts and Phenomena:701.1
; Semiconducting Materials:712.1
; Semiconductor Devices and Integrated Circuits:714.2
; Light/Optics:741.1
; Inorganic Compounds:804.2
; Production Engineering:913.1
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ESI学科分类 | PHYSICS
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Scopus记录号 | 2-s2.0-85124138191
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来源库 | Scopus
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引用统计 |
被引频次[WOS]:2
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成果类型 | 期刊论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/284464 |
专题 | 工学院 工学院_电子与电气工程系 |
作者单位 | 1.State Key Laboratory of Reliability and Intelligence of Electrical Equipment,Hebei University of Technology,Tianjin,5340 Xiping Road, Beichen District,300401,China 2.Key Laboratory of Electronic Materials and Devices of Tianjin,School of Electronics and Information Engineering,Hebei University of Technology,Tianjin,5340 Xiping Road, Beichen District,300401,China 3.Department of Electrical and Electronic Engineering,College of Engineering,South University of Science and Technology,Guangdong,1088 Xue-Yuan Road, Nanshan, Shenzhen,518055,China |
推荐引用方式 GB/T 7714 |
Che,Jiamang,Shao,Hua,Chu,Chunshuang,et al. Enhanced performance of an AlGaN-based deep ultraviolet light-emitting diode using a p+-GaN/SiO2/ITO tunnel junction[J]. OPTICS LETTERS,2022,47(4):798-801.
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APA |
Che,Jiamang.,Shao,Hua.,Chu,Chunshuang.,Li,Qingqing.,Zhang,Yonghui.,...&Zhang,Zi Hui.(2022).Enhanced performance of an AlGaN-based deep ultraviolet light-emitting diode using a p+-GaN/SiO2/ITO tunnel junction.OPTICS LETTERS,47(4),798-801.
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MLA |
Che,Jiamang,et al."Enhanced performance of an AlGaN-based deep ultraviolet light-emitting diode using a p+-GaN/SiO2/ITO tunnel junction".OPTICS LETTERS 47.4(2022):798-801.
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