题名 | Universal low-temperature Ohmic contacts for quantum transport in transition metal dichalcogenides |
作者 | |
通讯作者 | Wang, Ning |
发表日期 | 2016-06
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DOI | |
发表期刊 | |
ISSN | 2053-1583
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卷号 | 3期号:2 |
摘要 | Low carrier mobility and high electrical contact resistance are two major obstacles prohibiting explorations of quantum transport in TMDCs. Here, we demonstrate an effective method to establish low-temperature Ohmic contacts in boron nitride encapsulated TMDC devices based on selective etching and conventional electron-beam evaporation of metal electrodes. This method works for most extensively studied TMDCs in recent years, including MoS2, MoSe2, WSe2, WS2, and 2H-MoTe2. Low electrical contact resistance is achieved at 2 K. All of the few-layerTMDCdevices studied show excellent performance with remarkably improved field-effect mobilities ranging from 2300 to 16 000 cm 2 V-1 s(-1), as verified by the high carrier mobilities extracted from Hall effect measurements. Moreover, both high-mobility n-type and p-typeTMDCchannels can be realized by simply using appropriate contact metals. Prominent Shubnikov-de Haas oscillations have been observed and investigated in these high-quality TMDC devices. |
关键词 | |
相关链接 | [来源记录] |
收录类别 | |
语种 | 英语
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学校署名 | 其他
|
资助项目 | Research Grants Council of Hong Kong[16302215]
; Research Grants Council of Hong Kong[HKU9/CRF/13G]
; Research Grants Council of Hong Kong[604112]
; Research Grants Council of Hong Kong[N_HKUST613/12]
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WOS研究方向 | Materials Science
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WOS类目 | Materials Science, Multidisciplinary
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WOS记录号 | WOS:000378571400007
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出版者 | |
EI入藏号 | 20182205259648
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EI主题词 | Carrier mobility
; Contact resistance
; Current voltage characteristics
; Electric contactors
; Electric field effects
; Field effect transistors
; III-V semiconductors
; Layered semiconductors
; Molybdenum compounds
; Ohmic contacts
; Quantum electronics
; Temperature
; Transition metals
; Tungsten compounds
|
EI分类号 | Metallurgy and Metallography:531
; Thermodynamics:641.1
; Electricity: Basic Concepts and Phenomena:701.1
; Semiconducting Materials:712.1
; Semiconductor Devices and Integrated Circuits:714.2
; Physical Chemistry:801.4
; Quantum Theory; Quantum Mechanics:931.4
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来源库 | Web of Science
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引用统计 |
被引频次[WOS]:108
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成果类型 | 期刊论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/29611 |
专题 | 工学院_材料科学与工程系 |
作者单位 | 1.Hong Kong Univ Sci & Technol, Dept Phys, Hong Kong, Hong Kong, Peoples R China 2.Hong Kong Univ Sci & Technol, Ctr Quantum Mat 1D 2D, Hong Kong, Hong Kong, Peoples R China 3.Univ Texas Dallas, Dept Phys, Richardson, TX 75080 USA 4.South Univ Sci & Technol, Dept Mat Sci & Engn, Shenzhen 518055, Peoples R China 5.South Univ Sci & Technol, Shenzhen Key Lab Nanoimprint Technol, Shenzhen 518055, Peoples R China |
推荐引用方式 GB/T 7714 |
Xu, Shuigang,Wu, Zefei,Lu, Huanhuan,et al. Universal low-temperature Ohmic contacts for quantum transport in transition metal dichalcogenides[J]. 2D Materials,2016,3(2).
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APA |
Xu, Shuigang.,Wu, Zefei.,Lu, Huanhuan.,Han, Yu.,Long, Gen.,...&Wang, Ning.(2016).Universal low-temperature Ohmic contacts for quantum transport in transition metal dichalcogenides.2D Materials,3(2).
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MLA |
Xu, Shuigang,et al."Universal low-temperature Ohmic contacts for quantum transport in transition metal dichalcogenides".2D Materials 3.2(2016).
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条目包含的文件 | ||||||
文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | 操作 | |
Xu-2016-Universal lo(1840KB) | -- | -- | 限制开放 | -- |
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