题名 | Low temperature carrier transport study of monolayer MoS2 field effect transistors prepared by chemical vapor deposition under an atmospheric pressure |
作者 | |
通讯作者 | Liu, Xinke |
发表日期 | 2015-09-28
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DOI | |
发表期刊 | |
ISSN | 0021-8979
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EISSN | 1089-7550
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卷号 | 118期号:12 |
摘要 | Large size monolayer Molybdenum disulphide (MoS2) was successfully grown by chemical vapor deposition method under an atmospheric pressure. The electrical transport properties of the fabricated back-gate monolayer MoS2 field effect transistors (FETs) were investigated under low temperatures; a peak field effect mobility of 59 cm(2) V-1 s(-1) was achieved. With the assist of Raman measurement under low temperature, this work identified the mobility limiting factor for the monolayer MoS2 FETs: homopolar phonon scattering under low temperature and electron-polar optical phonon scattering at room temperature. (C) 2015 AIP Publishing LLC. |
相关链接 | [来源记录] |
收录类别 | |
语种 | 英语
|
学校署名 | 其他
|
资助项目 | National University of Singapore Faculty Research Committee[R-263-000-B21-133]
; National University of Singapore Faculty Research Committee[R-263-000-B21-731]
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WOS研究方向 | Physics
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WOS类目 | Physics, Applied
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WOS记录号 | WOS:000362565800040
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出版者 | |
EI入藏号 | 20154001326895
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EI主题词 | Atmospheric chemistry
; Atmospheric movements
; Atmospheric pressure
; Atmospheric temperature
; Chemical vapor deposition
; Electric field effects
; Layered semiconductors
; Molybdenum compounds
; Monolayers
; Phonon scattering
; Phonons
; Sulfur compounds
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EI分类号 | Atmospheric Properties:443.1
; Electricity: Basic Concepts and Phenomena:701.1
; Semiconductor Devices and Integrated Circuits:714.2
; Chemical Reactions:802.2
|
ESI学科分类 | PHYSICS
|
来源库 | Web of Science
|
引用统计 |
被引频次[WOS]:19
|
成果类型 | 期刊论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/29922 |
专题 | 工学院_材料科学与工程系 |
作者单位 | 1.Shenzhen Univ, Nanshan Dist Key Lab Biopolymer & Safety Evaluat, Shenzhen Engn Lab Adv Technol Ceram, Coll Mat Sci & Engn, Shenzhen 518060, Peoples R China 2.Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China 3.Fudan Univ, Dept Microelect, State Key Lab AS1C & Syst, Shanghai 200433, Peoples R China 4.Natl Univ Singapore, Dept Phys, Singapore 117576, Singapore 5.South Univ Sci & Technol China, Dept Mat Sci & Engn, Shenzhen 518055, Peoples R China 6.Natl Univ Singapore, Dept Elect & Comp Engn, Singapore 117583, Singapore |
推荐引用方式 GB/T 7714 |
Liu, Xinke,He, Jiazhu,Liu, Qiang,et al. Low temperature carrier transport study of monolayer MoS2 field effect transistors prepared by chemical vapor deposition under an atmospheric pressure[J]. JOURNAL OF APPLIED PHYSICS,2015,118(12).
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APA |
Liu, Xinke.,He, Jiazhu.,Liu, Qiang.,Tang, Dan.,Wen, Jiao.,...&Ang, Kah-Wee.(2015).Low temperature carrier transport study of monolayer MoS2 field effect transistors prepared by chemical vapor deposition under an atmospheric pressure.JOURNAL OF APPLIED PHYSICS,118(12).
|
MLA |
Liu, Xinke,et al."Low temperature carrier transport study of monolayer MoS2 field effect transistors prepared by chemical vapor deposition under an atmospheric pressure".JOURNAL OF APPLIED PHYSICS 118.12(2015).
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条目包含的文件 | ||||||
文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | 操作 | |
Liu-2015-Low tempera(2444KB) | -- | -- | 限制开放 | -- |
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