题名 | Phase transition, effective mass and carrier mobility of MoS2 monolayer under tensile strain |
作者 | |
通讯作者 | Yu, Sheng |
发表日期 | 2015-01-15
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DOI | |
发表期刊 | |
ISSN | 0169-4332
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EISSN | 1873-5584
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卷号 | 325期号:C页码:27-32 |
摘要 | We report a computational study on the impact of tensile strain on MoS2 monolayer. The transition between direct and indirect bandgap structure and the transition between semiconductor and metal phases in the monolayer have been investigated with tensile strain along all direction configurations with both x-axis and y-axis components epsilon(xy) (epsilon(x) and epsilon(y)). Electron effective mass and the hole effective mass are isotropic for biaxial strain epsilon(xy) = epsilon(x) = epsilon(y) and anisotropic for epsilon(xy) with epsilon(x) not equal epsilon(y). The carrier effective mass behaves differently along different directions in response to the tensile strain. In addition, the impact of strain on carrier mobility has been studied by using the deformation potential theory. The electron mobility increases over 10 times with the biaxial strain: epsilon(x) = epsilon(y) = 9.5%. Also, the mobility decreases monotonically with the increasing temperature as mu similar to T-1. These results are very important for future nanotechnology based on two-dimensional materials. (C) 2014 Elsevier B.V. All rights reserved. |
关键词 | |
相关链接 | [来源记录] |
收录类别 | |
语种 | 英语
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学校署名 | 其他
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资助项目 | U.S. NSF[ECCS-1407807]
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WOS研究方向 | Chemistry
; Materials Science
; Physics
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WOS类目 | Chemistry, Physical
; Materials Science, Coatings & Films
; Physics, Applied
; Physics, Condensed Matter
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WOS记录号 | WOS:000347105500004
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出版者 | |
EI入藏号 | 20151600752071
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EI主题词 | Carrier mobility
; Computation theory
; Layered semiconductors
; Molybdenum compounds
; Monolayers
; Phase transitions
; Sulfur compounds
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EI分类号 | Semiconducting Materials:712.1
; Computer Theory, Includes Formal Logic, Automata Theory, Switching Theory, Programming Theory:721.1
; Physical Chemistry:801.4
; Mechanics:931.1
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ESI学科分类 | MATERIALS SCIENCE
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来源库 | Web of Science
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引用统计 |
被引频次[WOS]:130
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成果类型 | 期刊论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/30050 |
专题 | 工学院_电子与电气工程系 |
作者单位 | 1.George Mason Univ, Dept Elect & Comp Engn, Fairfax, VA 22030 USA 2.South Univ Sci & Technol China, Dept Elect & Elect Engn, Shenzhen, Peoples R China 3.NIST, Semicond & Dimens Metrol Div, Gaithersburg, MD 20899 USA |
推荐引用方式 GB/T 7714 |
Yu, Sheng,Xiong, Hao D.,Eshun, Kwesi,et al. Phase transition, effective mass and carrier mobility of MoS2 monolayer under tensile strain[J]. APPLIED SURFACE SCIENCE,2015,325(C):27-32.
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APA |
Yu, Sheng,Xiong, Hao D.,Eshun, Kwesi,Yuan, Hui,&Li, Qiliang.(2015).Phase transition, effective mass and carrier mobility of MoS2 monolayer under tensile strain.APPLIED SURFACE SCIENCE,325(C),27-32.
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MLA |
Yu, Sheng,et al."Phase transition, effective mass and carrier mobility of MoS2 monolayer under tensile strain".APPLIED SURFACE SCIENCE 325.C(2015):27-32.
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条目包含的文件 | ||||||
文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | 操作 | |
Yu-2015-Phase transi(1795KB) | -- | -- | 限制开放 | -- |
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