题名 | A study of lateral Schottky contacts in WSe2 and MoS2 field effect transistors using scanning photocurrent microscopy |
作者 | |
通讯作者 | He, Hongtao |
发表日期 | 2015
|
DOI | |
发表期刊 | |
ISSN | 2040-3364
|
EISSN | 2040-3372
|
卷号 | 7期号:38页码:15711-15718 |
摘要 | Schottky contacts, formed at metal/semiconductor interfaces, always have a large impact on the performance of field-effect transistors (FETs). Here, we report the experimental studies of Schottky contacts in two-dimensional (2D) transition metal dichalcogenide (TMDC) FET devices. We use scanning photocurrent microscopy (SPCM) to directly probe the spatial distribution of the in-plane lateral Schottky depletion regions at the metal/2D-TMDC interfaces. The laser incident position dependent and the gate voltage tunable polarity and magnitude of the short-circuit photocurrent reveal the existence of the in-plane Schottky depletion region laterally extending away from the metal contact edges along the channel. This lateral depletion region length is estimated to be around several microns and can be effectively tuned by the gate and drain-source biases. Our results solidify the importance of lateral Schottky depletion regions in the photoresponse of 2D TMDC optoelectronic devices. |
相关链接 | [来源记录] |
收录类别 | |
语种 | 英语
|
学校署名 | 通讯
|
资助项目 | National Natural Science Foundation of China[11204183]
; National Natural Science Foundation of China[11374135]
|
WOS研究方向 | Chemistry
; Science & Technology - Other Topics
; Materials Science
; Physics
|
WOS类目 | Chemistry, Multidisciplinary
; Nanoscience & Nanotechnology
; Materials Science, Multidisciplinary
; Physics, Applied
|
WOS记录号 | WOS:000361834100021
|
出版者 | |
EI入藏号 | 20154001333862
|
EI主题词 | Layered semiconductors
; Molybdenum compounds
; Optoelectronic devices
; Photocurrents
; Selenium compounds
; Transition metals
; Tungsten compounds
|
EI分类号 | Metallurgy and Metallography:531
; Semiconductor Devices and Integrated Circuits:714.2
; Light/Optics:741.1
; Optical Devices and Systems:741.3
|
来源库 | Web of Science
|
引用统计 |
被引频次[WOS]:43
|
成果类型 | 期刊论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/30067 |
专题 | 理学院_物理系 |
作者单位 | 1.Hong Kong Univ Sci & Technol, Dept Phys, Clear Water Bay, Hong Kong, Peoples R China 2.South Univ Sci & Technol China, Dept Phys, Shenzhen 518055, Guangdong, Peoples R China |
通讯作者单位 | 物理系 |
推荐引用方式 GB/T 7714 |
Yi, Ya,Wu, Changming,Liu, Hongchao,et al. A study of lateral Schottky contacts in WSe2 and MoS2 field effect transistors using scanning photocurrent microscopy[J]. Nanoscale,2015,7(38):15711-15718.
|
APA |
Yi, Ya,Wu, Changming,Liu, Hongchao,Zeng, Jiali,He, Hongtao,&Wang, Jiannong.(2015).A study of lateral Schottky contacts in WSe2 and MoS2 field effect transistors using scanning photocurrent microscopy.Nanoscale,7(38),15711-15718.
|
MLA |
Yi, Ya,et al."A study of lateral Schottky contacts in WSe2 and MoS2 field effect transistors using scanning photocurrent microscopy".Nanoscale 7.38(2015):15711-15718.
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条目包含的文件 | ||||||
文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | 操作 | |
Yi-2015-A study of l(1902KB) | -- | -- | 限制开放 | -- |
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