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题名

A study of lateral Schottky contacts in WSe2 and MoS2 field effect transistors using scanning photocurrent microscopy

作者
通讯作者He, Hongtao
发表日期
2015
DOI
发表期刊
ISSN
2040-3364
EISSN
2040-3372
卷号7期号:38页码:15711-15718
摘要
Schottky contacts, formed at metal/semiconductor interfaces, always have a large impact on the performance of field-effect transistors (FETs). Here, we report the experimental studies of Schottky contacts in two-dimensional (2D) transition metal dichalcogenide (TMDC) FET devices. We use scanning photocurrent microscopy (SPCM) to directly probe the spatial distribution of the in-plane lateral Schottky depletion regions at the metal/2D-TMDC interfaces. The laser incident position dependent and the gate voltage tunable polarity and magnitude of the short-circuit photocurrent reveal the existence of the in-plane Schottky depletion region laterally extending away from the metal contact edges along the channel. This lateral depletion region length is estimated to be around several microns and can be effectively tuned by the gate and drain-source biases. Our results solidify the importance of lateral Schottky depletion regions in the photoresponse of 2D TMDC optoelectronic devices.
相关链接[来源记录]
收录类别
SCI ; EI
语种
英语
学校署名
通讯
资助项目
National Natural Science Foundation of China[11204183] ; National Natural Science Foundation of China[11374135]
WOS研究方向
Chemistry ; Science & Technology - Other Topics ; Materials Science ; Physics
WOS类目
Chemistry, Multidisciplinary ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied
WOS记录号
WOS:000361834100021
出版者
EI入藏号
20154001333862
EI主题词
Layered semiconductors ; Molybdenum compounds ; Optoelectronic devices ; Photocurrents ; Selenium compounds ; Transition metals ; Tungsten compounds
EI分类号
Metallurgy and Metallography:531 ; Semiconductor Devices and Integrated Circuits:714.2 ; Light/Optics:741.1 ; Optical Devices and Systems:741.3
来源库
Web of Science
引用统计
被引频次[WOS]:43
成果类型期刊论文
条目标识符http://sustech.caswiz.com/handle/2SGJ60CL/30067
专题理学院_物理系
作者单位
1.Hong Kong Univ Sci & Technol, Dept Phys, Clear Water Bay, Hong Kong, Peoples R China
2.South Univ Sci & Technol China, Dept Phys, Shenzhen 518055, Guangdong, Peoples R China
通讯作者单位物理系
推荐引用方式
GB/T 7714
Yi, Ya,Wu, Changming,Liu, Hongchao,et al. A study of lateral Schottky contacts in WSe2 and MoS2 field effect transistors using scanning photocurrent microscopy[J]. Nanoscale,2015,7(38):15711-15718.
APA
Yi, Ya,Wu, Changming,Liu, Hongchao,Zeng, Jiali,He, Hongtao,&Wang, Jiannong.(2015).A study of lateral Schottky contacts in WSe2 and MoS2 field effect transistors using scanning photocurrent microscopy.Nanoscale,7(38),15711-15718.
MLA
Yi, Ya,et al."A study of lateral Schottky contacts in WSe2 and MoS2 field effect transistors using scanning photocurrent microscopy".Nanoscale 7.38(2015):15711-15718.
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