中文版 | English
题名

Solution Processed Tungsten Oxide Interfacial Layer for Efficient Hole-Injection in Quantum Dot Light-Emitting Diodes

作者
通讯作者Demir, Hilmi Volkan
发表日期
2014-01-29
DOI
发表期刊
ISSN
1613-6810
EISSN
1613-6829
卷号10期号:2页码:247-252
摘要

A highly efficient and stable QLED using an inorganic WO3 nanoparticle film as a hole injection layer is demonstrated.The resulting WO3 nanoparticle-based QLEDs also exhibit superior performance compared to that of the present PEDOT:PSS-based QLEDs. The results indicate that WO3 nanoparticles are promising solution-processed buffer layer materials and serve as a strong candidate for QLED technology towards the practical applications in the next-generation lighting and displays. © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

相关链接[来源记录]
收录类别
SCI ; EI
语种
英语
学校署名
其他
资助项目
National Natural Science Foundation of China (NSFC)[61006037] ; National Natural Science Foundation of China (NSFC)[61076015]
WOS研究方向
Chemistry ; Science & Technology - Other Topics ; Materials Science ; Physics
WOS类目
Chemistry, Multidisciplinary ; Chemistry, Physical ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied ; Physics, Condensed Matter
WOS记录号
WOS:000331112100003
出版者
EI入藏号
20140517259992
EI主题词
Buffer Layers ; Conducting Polymers ; Electron Injection ; Light Emitting Diodes ; Nanocrystals ; Nanoparticles ; Oxides ; Quantum Efficiency ; Semiconductor Quantum Dots ; Tungsten Compounds
EI分类号
Conducting Materials:708.2 ; Semiconductor Devices And Integrated Circuits:714.2 ; Nanotechnology:761 ; Chemical Products Generally:804 ; Quantum Theory ; Quantum Mechanics:931.4 ; Solid State Physics:933 ; Crystalline Solids:933.1
来源库
Web of Science
引用统计
被引频次[WOS]:104
成果类型期刊论文
条目标识符http://sustech.caswiz.com/handle/2SGJ60CL/30236
专题南方科技大学
工学院_电子与电气工程系
作者单位
1.Nanyang Technol Univ, Sch Elect & Elect Engn, Luminous Ctr Excellence Semicond Lighting & Disp, Singapore 639798, Singapore
2.Bilkent Univ, UNAM Inst Mat Sci & Nanotechnol, Dept Elect & Elect Engn, Dept Phys, TR-06800 Bilkent, Turkey
3.Nanyang Technol Univ, Sch Phys & Math Sci, Singapore 639798, Singapore
4.S China Univ Technol, Inst Opt Commun Mat, State Key Lab Luminescence Mat & Devices, Guangzhou 510641, Guangdong, Peoples R China
5.ASTAR, Inst Mat Res & Engn, Singapore 117602, Singapore
6.South Univ Sci & Technol, Shenzhen 518055, Guangdong, Peoples R China
推荐引用方式
GB/T 7714
Yang, Xuyong,Mutlugun, Evren,Zhao, Yongbiao,et al. Solution Processed Tungsten Oxide Interfacial Layer for Efficient Hole-Injection in Quantum Dot Light-Emitting Diodes[J]. Small,2014,10(2):247-252.
APA
Yang, Xuyong.,Mutlugun, Evren.,Zhao, Yongbiao.,Gao, Yuan.,Leck, Kheng Swee.,...&Sun, Xiao Wei.(2014).Solution Processed Tungsten Oxide Interfacial Layer for Efficient Hole-Injection in Quantum Dot Light-Emitting Diodes.Small,10(2),247-252.
MLA
Yang, Xuyong,et al."Solution Processed Tungsten Oxide Interfacial Layer for Efficient Hole-Injection in Quantum Dot Light-Emitting Diodes".Small 10.2(2014):247-252.
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