Crystallization and surface texturing of amorphous-Si induced by UV laser for photovoltaic application

Hong, Lei1; Wang, Xincai2; Rusli1; Wang, Hao1; Zheng, Hongyu2; Yu, Hongyu3

2012-02-15

10.1063/1.3686612

JOURNAL OF APPLIED PHYSICS   影响因子和分区

0021-8979

1089-7550

The DPSS Nd:YVO4 UV laser is used to anneal amorphous silicon (a-Si) film to achieve crystallization and nano-dome surface texturing simultaneously in a one-step annealing process. With pulse energy of 380 mJ/cm(2) and repetition rate of 20 kHz, the a-Si can be crystallized by the sequential lateral solidification process, which is evidenced by both SEM characterization and Raman spectra. In addition, the nano-dome like structure is confirmed by AFM characterization, which can lead to similar to 200% boost in terms of light absorption as measured by UV-Visible - Near-infrared scanning spectrophotometer. This study highlights the great potential of Nd: YVO4 UV laser for its application in thin film Si solar cell industry to improve the film quality and light trapping capability. (C) 2012 American Institute of Physics. [doi:10.1063/1.3686612]

SCI ; EI

英语

通讯

Physics

Physics, Applied

WOS:000300948600006

AMER INST PHYSICS

20121114845698

Chromium alloys ; Domes ; Infrared devices ; Light absorption ; Neodymium alloys ; Pulse repetition rate ; Silicon solar cells ; Spectrophotometers ; Thin film solar cells ; Thin films ; Ultraviolet lasers

Structural Members and Shapes:408.2 ; Chromium and Alloys:543.1 ; Rare Earth Metals:547.2 ; Nonferrous Metals and Alloys excluding Alkali and Alkaline Earth Metals:549.3 ; Solar Cells:702.3 ; Light/Optics:741.1 ; Optical Devices and Systems:741.3 ; Lasers, General:744.1

PHYSICS

Web of Science

1.Nanyang Technol Univ, Sch Elect & Elect Engn, Singapore 639798, Singapore
2.ASTAR, Singapore Inst Mfg Technol, Singapore 638075, Singapore
3.S Univ Sci & Technol China, Shenzhen, Peoples R China

Hong, Lei,Wang, Xincai,Rusli,et al. Crystallization and surface texturing of amorphous-Si induced by UV laser for photovoltaic application[J]. JOURNAL OF APPLIED PHYSICS,2012,111(4).

Hong, Lei,Wang, Xincai,Rusli,Wang, Hao,Zheng, Hongyu,&Yu, Hongyu.(2012).Crystallization and surface texturing of amorphous-Si induced by UV laser for photovoltaic application.JOURNAL OF APPLIED PHYSICS,111(4).

Hong, Lei,et al."Crystallization and surface texturing of amorphous-Si induced by UV laser for photovoltaic application".JOURNAL OF APPLIED PHYSICS 111.4(2012).