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题名

Growth of wafer-scale graphene-hexagonal boron nitride vertical heterostructures with clear interfaces for obtaining atomically thin electrical analogs

作者
发表日期
2022-02-10
DOI
发表期刊
ISSN
2040-3364
EISSN
2040-3372
卷号14期号:11页码:4204-4215
摘要
Two-dimensional (2D) integrated circuits based on graphene (Gr) heterostructures have emerged as next-generation electronic devices. However, it is still challenging to produce high-quality and large-area Gr/hexagonal boron nitride (h-BN) vertical heterostructures with clear interfaces and precise layer control. In this work, a two-step metallic alloy-assisted epitaxial growth approach has been demonstrated for producing wafer-scale vertical hexagonal boron nitride/graphene (h-BN/Gr) heterostructures with clear interfaces. The heterostructures maintain high uniformity while scaling up and thickening. The layer number of both h-BN and graphene can be independently controlled by tuning the growth process. Furthermore, conductance measurements confirm that electrical hysteresis disappears on h-BN/Gr field-effect transistors, which is attributed to the h-BN dielectric surface. Our work blazes a trail toward next-generation graphene-based analog devices.
相关链接[Scopus记录]
收录类别
SCI ; EI
语种
英语
学校署名
其他
WOS记录号
WOS:000763001800001
EI入藏号
20221411908259
EI主题词
Field effect transistors ; Graphene ; Graphene transistors ; III-V semiconductors ; Nitrides ; Quality control
EI分类号
Semiconducting Materials:712.1 ; Semiconductor Devices and Integrated Circuits:714.2 ; Nanotechnology:761 ; Chemical Products Generally:804 ; Inorganic Compounds:804.2 ; Quality Assurance and Control:913.3
Scopus记录号
2-s2.0-85127306449
来源库
Scopus
引用统计
被引频次[WOS]:7
成果类型期刊论文
条目标识符http://sustech.caswiz.com/handle/2SGJ60CL/329046
专题理学院_物理系
作者单位
1.Institute for Advanced Ceramics,School of Materials Science and Engineering,Harbin Institute of Technology,Harbin,Heilongjiang,150080,China
2.Key Laboratory of Micro-Systems and Micro-Structures Manufacturing of Ministry of Education,Harbin Institute of Technology,Harbin,150080,China
3.Department of Physics,Southern University of Science and Technology,Shenzhen,518055,China
4.School of Energy Science and Engineering,Harbin Institute of Technology,Harbin,150080,China
5.Institute for Frontier Materials,Deakin University,Waurn Ponds,Australia
推荐引用方式
GB/T 7714
Yang,Huihui,Wang,Gang,Guo,Yanming,et al. Growth of wafer-scale graphene-hexagonal boron nitride vertical heterostructures with clear interfaces for obtaining atomically thin electrical analogs[J]. Nanoscale,2022,14(11):4204-4215.
APA
Yang,Huihui.,Wang,Gang.,Guo,Yanming.,Wang,Lifeng.,Tan,Biying.,...&Hu,Ping An.(2022).Growth of wafer-scale graphene-hexagonal boron nitride vertical heterostructures with clear interfaces for obtaining atomically thin electrical analogs.Nanoscale,14(11),4204-4215.
MLA
Yang,Huihui,et al."Growth of wafer-scale graphene-hexagonal boron nitride vertical heterostructures with clear interfaces for obtaining atomically thin electrical analogs".Nanoscale 14.11(2022):4204-4215.
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