Spatial modulation of nanopattern dimensions by combining interference lithography and grayscale-patterned secondary exposure

Gan，Zhuofei1,2; Feng，Hongtao1; Chen，Liyang1; Min，Siyi1; Liang，Chuwei1; Xu，Menghong1; Jiang，Zijie1; Sun，Zhao1; Sun，Chuying1; Cui，Dehu2; Li，Wen Di1

2022-12-01

10.1038/s41377-022-00774-z

Light:Science & Applications   影响因子和分区

2095-5545

2047-7538

Functional nanostructures are exploited for a variety of cutting-edge fields including plasmonics, metasurfaces, and biosensors, just to name a few. Some applications require nanostructures with uniform feature sizes while others rely on spatially varying morphologies. However, fine manipulation of the feature size over a large area remains a substantial challenge because mainstream approaches to precise nanopatterning are based on low-throughput pixel-by-pixel processing, such as those utilizing focused beams of photons, electrons, or ions. In this work, we provide a solution toward wafer-scale, arbitrary modulation of feature size distribution by introducing a lithographic portfolio combining interference lithography (IL) and grayscale-patterned secondary exposure (SE). Employed after the high-throughput IL, a SE with patterned intensity distribution spatially modulates the dimensions of photoresist nanostructures. Based on this approach, we successfully fabricated 4-inch wafer-scale nanogratings with uniform linewidths of <5% variation, using grayscale-patterned SE to compensate for the linewidth difference caused by the Gaussian distribution of the laser beams in the IL. Besides, we also demonstrated a wafer-scale structural color painting by spatially modulating the filling ratio to achieve gradient grayscale color using SE.

SCI ; EI

英语

其他

Research Grants Council, University Grants Committee[17207419];Research Grants Council, University Grants Committee[17209320];University of Hong Kong[202010160046];University of Hong Kong[202011159235];Research Grants Council, University Grants Committee[AoE/P-701/20];Research Grants Council, University Grants Committee[C7018-20G];Science, Technology and Innovation Commission of Shenzhen Municipality[K20799112];

Optics

Optics

WOS:000781365500001

SPRINGERNATURE

20221611963897

Gaussian beams ; Laser beams ; Modulation ; Nanostructures ; Pixels ; Plasmonics

Electromagnetic Waves:711 ; Semiconductor Devices and Integrated Circuits:714.2 ; Laser Beam Interactions:744.8 ; Nanotechnology:761 ; Coating Materials:813.2 ; Plasma Physics:932.3 ; Solid State Physics:933

2-s2.0-85127976478

Scopus

1.Department of Mechanical Engineering,University of Hong Kong,Hong Kong
2.School of Microelectronics,Southern University of Science and Technology,Shenzhen,China

Gan，Zhuofei,Feng，Hongtao,Chen，Liyang,et al. Spatial modulation of nanopattern dimensions by combining interference lithography and grayscale-patterned secondary exposure[J]. Light:Science & Applications,2022,11(1).

Gan，Zhuofei.,Feng，Hongtao.,Chen，Liyang.,Min，Siyi.,Liang，Chuwei.,...&Li，Wen Di.(2022).Spatial modulation of nanopattern dimensions by combining interference lithography and grayscale-patterned secondary exposure.Light:Science & Applications,11(1).

Gan，Zhuofei,et al."Spatial modulation of nanopattern dimensions by combining interference lithography and grayscale-patterned secondary exposure".Light:Science & Applications 11.1(2022).