题名 | Exploring epitaxial growth of ZnTe thin films on Si substrates |
作者 | |
通讯作者 | Li,Wei; Liu,Cai |
发表日期 | 2022-08-01
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DOI | |
发表期刊 | |
ISSN | 0042-207X
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卷号 | 202 |
摘要 | Epitaxial growth of ZnTe on Si occurred via matching of eight ZnTe (111) planes with nine Si (111) planes. However, the stacking faults existed in the ZnTe/Si system due to the release of strain energy in initial growth. To further improve ZnTe epilayer quality, different architectures containing ZnTe nucleation layer, or ZnSe buffer layer were grown on Si substrates. The fewer defects can be found across the interfaces for ZnTe/ZnSe with 12/13 or 13/14 matching and ZnSe/Si with 21/22 or 21/23 matching of major planes. Only {111}-oriented domain formed in the ZnTe epilayer for the large-lattice-mismatched samples. The improved ZnTe (111) epitaxial thin films with single domain exhibit the narrowest FWHM of ∼180 arc sec with a dislocation density of 5.14 × 10 cm . Extra half-planar arrays formed at the interfaces of ZnTe/ZnSe, ZnSe/Si were clearly visible through inverse fast Fourier transformation images. Moreover, the fully relaxed ZnTe epilayer with the most balanced residual stress was obtained in the X and Y directions. |
关键词 | |
相关链接 | [Scopus记录] |
收录类别 | |
语种 | 英语
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学校署名 | 通讯
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EI入藏号 | 20222112143734
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EI主题词 | Buffer layers
; Epilayers
; Epitaxial growth
; Selenium compounds
; Silicon
; Strain energy
; Tellurium compounds
; Thin films
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EI分类号 | Nonferrous Metals and Alloys excluding Alkali and Alkaline Earth Metals:549.3
; Semiconducting Materials:712.1
; Chemical Operations:802.3
; Mechanics:931.1
; Crystalline Solids:933.1
; Crystal Growth:933.1.2
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ESI学科分类 | MATERIALS SCIENCE
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Scopus记录号 | 2-s2.0-85130324080
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来源库 | Scopus
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引用统计 |
被引频次[WOS]:2
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成果类型 | 期刊论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/335448 |
专题 | 理学院_物理系 量子科学与工程研究院 |
作者单位 | 1.College of Materials Science and Engineering,Sichuan University,Chengdu,610064,China 2.Shenzhen Institute for Quantum Science and Engineering,Southern University of Science and Technology,Shenzhen,518055,China 3.International Quantum Academy,Shenzhen,518048,China 4.Department of Physics,Southern University of Science and Technology,Shenzhen,518055,China |
通讯作者单位 | 物理系; 量子科学与工程研究院 |
推荐引用方式 GB/T 7714 |
Zhu,Xiaolong,Wu,Jianqiang,Li,Wei,et al. Exploring epitaxial growth of ZnTe thin films on Si substrates[J]. VACUUM,2022,202.
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APA |
Zhu,Xiaolong,Wu,Jianqiang,Li,Wei,Liu,Cai,Zhang,Jingquan,&Hu,Songbai.(2022).Exploring epitaxial growth of ZnTe thin films on Si substrates.VACUUM,202.
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MLA |
Zhu,Xiaolong,et al."Exploring epitaxial growth of ZnTe thin films on Si substrates".VACUUM 202(2022).
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条目包含的文件 | 条目无相关文件。 |
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