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题名

Exploring epitaxial growth of ZnTe thin films on Si substrates

作者
通讯作者Li,Wei; Liu,Cai
发表日期
2022-08-01
DOI
发表期刊
ISSN
0042-207X
卷号202
摘要
Epitaxial growth of ZnTe on Si occurred via matching of eight ZnTe (111) planes with nine Si (111) planes. However, the stacking faults existed in the ZnTe/Si system due to the release of strain energy in initial growth. To further improve ZnTe epilayer quality, different architectures containing ZnTe nucleation layer, or ZnSe buffer layer were grown on Si substrates. The fewer defects can be found across the interfaces for ZnTe/ZnSe with 12/13 or 13/14 matching and ZnSe/Si with 21/22 or 21/23 matching of major planes. Only {111}-oriented domain formed in the ZnTe epilayer for the large-lattice-mismatched samples. The improved ZnTe (111) epitaxial thin films with single domain exhibit the narrowest FWHM of ∼180 arc sec with a dislocation density of 5.14 × 10 cm . Extra half-planar arrays formed at the interfaces of ZnTe/ZnSe, ZnSe/Si were clearly visible through inverse fast Fourier transformation images. Moreover, the fully relaxed ZnTe epilayer with the most balanced residual stress was obtained in the X and Y directions.
关键词
相关链接[Scopus记录]
收录类别
语种
英语
学校署名
通讯
EI入藏号
20222112143734
EI主题词
Buffer layers ; Epilayers ; Epitaxial growth ; Selenium compounds ; Silicon ; Strain energy ; Tellurium compounds ; Thin films
EI分类号
Nonferrous Metals and Alloys excluding Alkali and Alkaline Earth Metals:549.3 ; Semiconducting Materials:712.1 ; Chemical Operations:802.3 ; Mechanics:931.1 ; Crystalline Solids:933.1 ; Crystal Growth:933.1.2
ESI学科分类
MATERIALS SCIENCE
Scopus记录号
2-s2.0-85130324080
来源库
Scopus
引用统计
被引频次[WOS]:2
成果类型期刊论文
条目标识符http://sustech.caswiz.com/handle/2SGJ60CL/335448
专题理学院_物理系
量子科学与工程研究院
作者单位
1.College of Materials Science and Engineering,Sichuan University,Chengdu,610064,China
2.Shenzhen Institute for Quantum Science and Engineering,Southern University of Science and Technology,Shenzhen,518055,China
3.International Quantum Academy,Shenzhen,518048,China
4.Department of Physics,Southern University of Science and Technology,Shenzhen,518055,China
通讯作者单位物理系;  量子科学与工程研究院
推荐引用方式
GB/T 7714
Zhu,Xiaolong,Wu,Jianqiang,Li,Wei,et al. Exploring epitaxial growth of ZnTe thin films on Si substrates[J]. VACUUM,2022,202.
APA
Zhu,Xiaolong,Wu,Jianqiang,Li,Wei,Liu,Cai,Zhang,Jingquan,&Hu,Songbai.(2022).Exploring epitaxial growth of ZnTe thin films on Si substrates.VACUUM,202.
MLA
Zhu,Xiaolong,et al."Exploring epitaxial growth of ZnTe thin films on Si substrates".VACUUM 202(2022).
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