基于介电泳/磁流变复合效应的超精密抛光基础研究

磁性复合流体抛光是一种重要的超精密加工方法，在抛光非球面、微结构表面、管内壁等不规则表面有着广泛的应用前景，但是其较低的加工效率直接导致了抛光成本的提高。而多场辅助精密加工在提高加工精度和加工效率方面发挥着重要的作用。针对磁性复合流体抛光效率低的问题，本文研究一种基于磁流变与介电泳复合效应的超精密抛光方法。从介电泳原理的角度对抛光液中磨粒介电泳效应发生的可行性进行了研究，探索了介电泳控制磨粒定向运动的条件；根据磨粒介电泳效应发生条件设计介电场发生机构，搭建了基于介电泳与磁流变复合效应的抛光装置；并利用电磁学理论和经典力学理论对磨粒在加工过程中的受力进行数学建模，得到介电泳力、磁悬浮力、重力对磨粒运动的影响以及定量关系；最后，与传统的磁性复合流体抛光方法进行了材料去除率和表面粗糙度的对比实验，对实验结果进行分析，结果表明，利用磁性复合流体抛光液中的中性磨粒在非均匀电场作用下的介电泳现象，控制磨粒定向运动，能够使更多磨粒往工件加工表面聚集，提高抛光过程中参与材料去除的有效磨粒的数量，在获得高质量光滑表面的同时，实现高效加工。

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