基于碳膜增强形核的超薄金刚石膜生长研究

  光学保护膜是光学材料在应用过程中对其起保护作用的一种重要的防护材料，它不仅可以保持光学材料优异的光学性能，而且可以防止其在机械磨损、生物化学腐蚀、辐射等条件下过早地发生破坏从而使得光学器件失效。超薄金刚石膜因其优异的抗磨损、抗化学腐蚀，以及光学透过性能等，是一种综合性能十分优异的光学保护膜材料。针对目前超薄金刚石膜在制备过程中存在的厚度过厚（形核密度低）以及合成过程复杂等问题，本研究创新性地采用一种以超薄碳膜作为形核增强层的超薄金刚石膜制备方法，通过对金刚石膜在热丝化学气相沉积中生长行为的系统研究，并结合使用等离子体气相沉积技术在石英玻璃上沉积作为增强形核层的10 nm左右厚度碳膜，最终成功在石英玻璃表面制备了厚度为~30 nm的超薄纳米金刚石膜。该过程中纳米金刚石膜的形核密度高达3.8×10¹¹ cm^-2，沉积超薄金刚石膜后的石英玻璃在可见光-近红外波段仍具有≥ 90%的光学透过率。该高形核密度的获得可能是因为碳膜在纳米金刚石膜生长之前由于氢原子的刻蚀作用形成表面缺陷，从而增强了纳米金刚石膜的形核。该方法具有制备过程简单，所制备的超薄金刚石膜性能优异等特点，对促进超薄金刚石保护膜的应用将起到重要的参考作用。

Optical protective film is an important protective material for optical devices in the application process. It can not only maintain the excellent optical properties, but also prevent the untimely damage of optical devices in mechanical abrasion, biochemical corrosion, radiation and other conditions. Ultra-thin diamond film is an excellent optical protective film due to its outstanding abrasion resistance, excellent chemical corrosion resistance and good optical transmission performance. In this study, an innovative preparation method of ultra-thin diamond film was adopted. In the preparation process, the ultra-thin carbon film was used as the nucleation enhancement layer to solve the existing problems such as excessive thickness (low nucleation density) and complex synthesis process in the preparation process of ultra-thin diamond film. By systematically studying the growth behavior of diamond film in hot filament chemical vapor deposition and using plasma vapor deposition technology to deposit carbon film with thickness of about 10 nm on quartz glass as enhanced nucleation layer, ultra-thin diamond film with thickness of ~30 nm was successfully prepared on quartz glass surface. In this process, the nucleation density of nano-diamond film is as high as 3.8×10¹¹ cm^-2, and the quartz glass after deposition of ultra-thin diamond film still has an optical transmittance with ≥ 90% in visible to near infrared band. The high nucleation density is considered to be due to the surface defects of carbon film caused by the H atoms etching before the growth of nano-diamond film, thus enhancing the nucleation of nano-diamond film. This method has advantages of simple preparation process and excellent performance of ultra-thin diamond film, which will play an important role in promoting the application of ultra-thin diamond protective films.

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