基于大气等离子体的熔石英无损超光滑表面创成机理与工艺探究

熔石英以其良好的化学和机械性能以及优异的光学特性在集成电路制造领域中发挥着至关重要的作用。然而，随着技术的不断发展，熔石英光学元件的损伤与表面精度要求也不断提高，传统的接触式加工工艺会不可避免的产生亚表面损伤，极大程度地影响了熔石英光学元件的性能及使用寿命，因此，熔石英光学元件的高效无损加工工艺是实现高性能光学元件制造亟需解决的问题。大气等离子体作为一种非接触式工艺因其高效无损的特点得到了越来越广泛的关注，本文将大气电感耦合等离子体引入到熔石英表面抛光工艺中，并对基于等离子体的熔石英的无损超光滑表面创成机理与工艺进行研究，具体的研究内容如下。

研究了基于等离子体化学刻蚀的熔石英的材料去除机理与损伤去除过程中的表面形貌演变规律，并提出了等离子体各向同性刻蚀抛光技术，展开了等离子体各向同性刻蚀抛光熔石英的机理与工艺探究，并且成功实现了表面粗糙度为17.4 nm的无损抛光表面。

研究了非减材模式下的等离子体对熔石英表面作用的影响，并提出了等离子体诱导原子迁移制造技术，展开了基于等离子体诱导原子迁移制造技术的熔石英无损超光滑表面创成机理与工艺探究，通过对工艺参数的优化将磨削加工表面抛光至表面粗糙度为0.15 nm的无损超光滑表面。

探究了等离子体诱导原子迁移制造技术的应用，验证了熔石英曲面抛光与熔石英表面损伤修复的可行性，揭示了等离子体诱导原子迁移制造技术对熔石英面形精度的影响。此外，分析了该技术当前存在的缺陷与的改进方案。

Fused silica plays a vital role in the integrated circuit manufacturing for its good chemical, mechanical, and optical properties. With the development of the technology, the requirements for surface accuracy and defect of fused silica optics are increasing as well. However, the traditional contacting processing technologies will inevitably introduce sub-surface damage, which greatly affects the performance and service life of fused silica components. Therefore, an efficient and non-destructive processing technology of fused silica is an urgent problem to be solved to realize the manufacturing of high-performance optical components. As a non-contact technology, atmospheric plasma has received much attention due to its high efficiency and non-destructive characteristics. In this paper, atmospheric inductively coupled plasma was introduced into the polishing process of fused silica and the principle of the plasma-based nondestructively ultra-smooth surface of fused silica was also studied. The main contents of this paper are as follows.

The material removal mechanism and surface morphology evolution of fused silica by plasma chemical etching were studied. Based on this, the plasma isotropic etching polishing technology was proposed and the mechanism and process of fused silica were investigated. Under the optimized condition, a damage-free surface with Sa roughness of 17.4 nm was successfully achieved.

This paper also studied the treatment of plasma on the fused silica surface in a non-subtractive mode and proposed the plasma-induced atom migration manufacturing (PAMM) technology. And the surface finishing mechanism and process of PAMM were studied. Through the optimized parameters, a damage-free surface with Sa surface roughness of 0.15 nm was obtained from a ground surface.

Finally, the application of PAMM in spherical surface polishing and surface damage recovery of fused silica was investigated and the influence of PAMM on surface shape accuracy was demonstrated. In addition, the current drawbacks and potential improvements of this technology were analyzed.

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