一种单晶碳化硅材料的加工设备

本实用新型涉及机械加工技术领域，提供了一种单晶碳化硅材料的加工设备，包括磨削装置和射流装置，射流装置用于对单晶碳化硅工件喷射电解液，磨削装置用于对喷射电解液后的单晶碳化硅材料进行磨削加工，使在工件表面被高速氧化后产生的氧化膜立刻被磨削去除，可增加磨削精度和磨削效率，磨削后不会对单晶碳化硅表面形成损伤层。

The utility model relates to the technical field of machining. The utility model provides processing equipment for a single crystal silicon carbide material. The device comprises a grinding device anda jet device, the jetting device is used for jetting electrolyte to the single crystal silicon carbide workpiece; the grinding device is used for grinding the single crystal silicon carbide materialsprayed with the electrolyte, so that an oxide film generated after the surface of a workpiece is oxidized at a high speed is immediately ground and removed, the grinding precision and the grinding efficiency can be improved, and a damage layer cannot be formed on the surface of the single crystal silicon carbide material after grinding.