题名 | Advantages of All-Copper Interconnects in SiC MOSFET Packaging: Effective Reduction of Spurious Parameters |
作者 | |
DOI | |
发表日期 | 2022
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ISBN | 978-1-6654-9906-4
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会议录名称 | |
页码 | 1-3
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会议日期 | 10-13 Aug. 2022
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会议地点 | Dalian, China
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摘要 | SiC MOSFET has the small junction capacitance and low gate charge, and its witching processes are fast in both dv/dt and di/dt. Due to the presence of large stray inductors in traditional wire bonding (WB) packages, a series of drawbacks such as oscillations and electromagnetic interference will occur at higher di/dt. This paper mainly studies the device spurious parameters and thermal performance under the package of different structures by simulation based on the advantages of all-copper interconnects. By studying the stray parameters and thermal performance generated by different interconnect methods, the optimal interconnect model is selected to lay the theoretical foundation for subsequent sample production. We find that the all-copper interconnected package model with ceramic heat dissipation has the best heat dissipation effect. It also has absolute advantages in reducing parasitic inductance and parasitic resistance. This provides a good theoretical basis for subsequent actual production. |
关键词 | |
学校署名 | 其他
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相关链接 | [IEEE记录] |
来源库 | IEEE
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全文链接 | https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=9873133 |
引用统计 |
被引频次[WOS]:0
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成果类型 | 会议论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/401550 |
专题 | 南方科技大学 |
作者单位 | 1.Sky Chip Interconnection Technology co., LTD, Shenzhen, China 2.Product Research and Development, Sky Chip Interconnection Technology co., LTD, Shenzhen, China 3.Academy for Engineering & Technology, Fudan University, Shanghai, China 4.Chongqing University, Southern University of Science and Technology, Shenzhen, China |
推荐引用方式 GB/T 7714 |
Jing Jiang,Chenshan Gao,Guoqi Zhang,et al. Advantages of All-Copper Interconnects in SiC MOSFET Packaging: Effective Reduction of Spurious Parameters[C],2022:1-3.
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条目包含的文件 | 条目无相关文件。 |
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