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题名

Advantages of All-Copper Interconnects in SiC MOSFET Packaging: Effective Reduction of Spurious Parameters

作者
DOI
发表日期
2022
ISBN
978-1-6654-9906-4
会议录名称
页码
1-3
会议日期
10-13 Aug. 2022
会议地点
Dalian, China
摘要
SiC MOSFET has the small junction capacitance and low gate charge, and its witching processes are fast in both dv/dt and di/dt. Due to the presence of large stray inductors in traditional wire bonding (WB) packages, a series of drawbacks such as oscillations and electromagnetic interference will occur at higher di/dt. This paper mainly studies the device spurious parameters and thermal performance under the package of different structures by simulation based on the advantages of all-copper interconnects. By studying the stray parameters and thermal performance generated by different interconnect methods, the optimal interconnect model is selected to lay the theoretical foundation for subsequent sample production. We find that the all-copper interconnected package model with ceramic heat dissipation has the best heat dissipation effect. It also has absolute advantages in reducing parasitic inductance and parasitic resistance. This provides a good theoretical basis for subsequent actual production.
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IEEE
全文链接https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=9873133
引用统计
被引频次[WOS]:0
成果类型会议论文
条目标识符http://sustech.caswiz.com/handle/2SGJ60CL/401550
专题南方科技大学
作者单位
1.Sky Chip Interconnection Technology co., LTD, Shenzhen, China
2.Product Research and Development, Sky Chip Interconnection Technology co., LTD, Shenzhen, China
3.Academy for Engineering & Technology, Fudan University, Shanghai, China
4.Chongqing University, Southern University of Science and Technology, Shenzhen, China
推荐引用方式
GB/T 7714
Jing Jiang,Chenshan Gao,Guoqi Zhang,et al. Advantages of All-Copper Interconnects in SiC MOSFET Packaging: Effective Reduction of Spurious Parameters[C],2022:1-3.
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