题名 | Low cost fabrication of high contrast ratio and high transmission wire grid polarizer by nanoimprint lithography |
作者 | |
通讯作者 | Cheng,Xing |
DOI | |
发表日期 | 2018
|
ISSN | 0097-966X
|
EISSN | 2168-0159
|
会议录名称 | |
卷号 | 49
|
期号 | S1
|
摘要 | This paper proposes a novel approach for low cost fabrication of large area wire grid polarizer (WGP). WGPs regarded as one potential alternative to traditional rear polarizer and DBEF possess the advantages of large contrast ratio (CR), high transmission. To date WGPs can be fabricated through electron beam direct write, which is slow and expensive, therefore not suitable for large area application. With the development of nano-fabrication methods, for instance, nanoimprint lithography (NIL), large area WGP can be made at low cost and fast speed. Furthermore, flexible polarizer can also be made through roll-to-roll (R2R) NIL. In this paper, a WGP with high TM transmission of around 85% and low TE transmission down to 0.2% through the visible light spectra will be realized through nanofabrication. The contrast ratio of the WGP can reach >450 with peak value >3000. For the fabrication process, atom layer deposition (ALD) will be utilized to prepare imprint mask which can achieve highly precise control of expected structure. In this paper, characterization of the designed WGP will also be narrated in the back part, including transmission, CR and the SEM schematic diagram. We believe that low cost fabrication method shows the potential to be adopted for industrial fabrication of polarizer in the future. |
关键词 | |
学校署名 | 通讯
|
语种 | 英语
|
相关链接 | [Scopus记录] |
Scopus记录号 | 2-s2.0-85140212151
|
来源库 | Scopus
|
引用统计 |
被引频次[WOS]:0
|
成果类型 | 会议论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/406935 |
专题 | 工学院_材料科学与工程系 |
作者单位 | 1.State Key Laboratory on Advanced Displays and Optoelectronics Technologies,Hong Kong University of Science and Technology,Kowloon,Clear Water Bay,Hong Kong 2.Department of Material Science and Engineering,Southern University of Science and Technology,Shenzhen,China |
第一作者单位 | 材料科学与工程系 |
通讯作者单位 | 材料科学与工程系 |
推荐引用方式 GB/T 7714 |
Quan,Dun Hang,Cheng,Xing,Kwok,Hoi Sing. Low cost fabrication of high contrast ratio and high transmission wire grid polarizer by nanoimprint lithography[C],2018.
|
条目包含的文件 | 条目无相关文件。 |
|
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。
修改评论