Fabrication of CdSe/ZnS Quantum Dot Color Filters via Photolithography Process

Zhao，Bingxin2; Lu，Rui1; Hao，Junjie1; Li，Shang1; Bai，Xue1; Wang，Liduo2; Wang，Kai1; Sun，Xiao Wei1

10.1002/SDTP.12678

2018

0097-966X

2168-0159

Digest of Technical Papers - SID International Symposium

49

S1

Quantum dots color filter (QDCF) is potential to be a game-changer for display and micro LED industry. In this paper, highly fluorescent QDCF have been prepared by changing surface active ligand of CdSe@ZnS to nonreactive ligand for photolithographic patterning. The quantum dots (QDs) with inactivated ligand avoids chemical reaction during the photolithography process. The 4 μm thickness QDCF with 28.8% (red) absolute PL quantum yield ( λmax of 630.16 nm) has been achieved after the photolithograpy process, while the QDs with surface active sites failed to form a patterned film. This may be due to the coordination of activated bonds with photoresist and the occurrence of complexation reaction.

color filter ligand photoresist Quantum dots

通讯

英语

2-s2.0-85121546210

Scopus

1.Department of Electrical & Electronic Engineering,Southern University of Science and Technology,Shenzhen,China
2.Tsinghua University,Beijing,China

Zhao，Bingxin,Lu，Rui,Hao，Junjie,et al. Fabrication of CdSe/ZnS Quantum Dot Color Filters via Photolithography Process[C],2018.