中文版 | English
题名

A two-terminal binary HfO2 resistance switching random access memory for an artificial synaptic device

作者
通讯作者Zhu, Yuan; Su, Longxing
共同第一作者Chen, Xiaozhang; Lv, You; Tian, Zhaobo
发表日期
2023-01-05
DOI
发表期刊
ISSN
2050-7526
EISSN
2050-7534
卷号11期号:2
摘要

In this study, we developed an artificial synaptic device based on the HfO2 nanocrystals synthesized using a simple hydrothermal method. The metal-insulator-metal (MIM) structure device is designed and fabricated by combining a ceramic-like preparation technique and a standard electrode preparation method. The MIM device shows robust bipolar resistance switching characteristics with high endurance and long retention. High concentration hafnium vacancies are determined, and the formation/rupture of the conductive filament model is proposed to be responsible for the switching behavior between a high resistance state (HRS) and a low resistance state (LRS). In addition, the artificial synaptic device is simulated by applying an external pulse signal with different repetition rates and pulse widths, which exhibits synaptic functions of short term plasticity and long term plasticity. This study demonstrates that HfO2 with abundant hafnium vacancies is a potential prototype material that can be fabricated as an artificial synaptic device for mimicking the synapse of the human brain.

相关链接[来源记录]
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语种
英语
学校署名
第一 ; 共同第一 ; 通讯
资助项目
National Natural Science Foundation of China[
WOS研究方向
Materials Science ; Physics
WOS类目
Materials Science, Multidisciplinary ; Physics, Applied
WOS记录号
WOS:000899693000001
出版者
来源库
Web of Science
引用统计
被引频次[WOS]:1
成果类型期刊论文
条目标识符http://sustech.caswiz.com/handle/2SGJ60CL/424056
专题工学院_深港微电子学院
作者单位
1.Southern Univ Sci & Technol, Sch Microelect, Shenzhen 518055, Peoples R China
2.Southern Univ Sci & Technol, Engn Res Ctr Integrated Circuits Next Generat Comm, Minist Educ, Shenzhen 518055, Peoples R China
第一作者单位深港微电子学院
通讯作者单位深港微电子学院;  南方科技大学
第一作者的第一单位深港微电子学院
推荐引用方式
GB/T 7714
Chen, Xiaozhang,Lv, You,Tian, Zhaobo,et al. A two-terminal binary HfO2 resistance switching random access memory for an artificial synaptic device[J]. Journal of Materials Chemistry C,2023,11(2).
APA
Chen, Xiaozhang,Lv, You,Tian, Zhaobo,Yang, Jingxi,Zhu, Yuan,&Su, Longxing.(2023).A two-terminal binary HfO2 resistance switching random access memory for an artificial synaptic device.Journal of Materials Chemistry C,11(2).
MLA
Chen, Xiaozhang,et al."A two-terminal binary HfO2 resistance switching random access memory for an artificial synaptic device".Journal of Materials Chemistry C 11.2(2023).
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