Patterning of high-aspect-ratio nanogratings using phase-locked two-beam fiber-optic interference lithography

Gan，Zhuofei1,2; Cai，Jingxuan1; Liang，Chuwei1; Chen，Liyang1; Min，Siyi1,3; Cheng，Xing3; Cui，Dehu2; Li，Wen Di1

2019-11-01

10.1116/1.5123220

Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics   影响因子和分区

2166-2746

2166-2754

Patterning high-aspect-ratio gratings by the phase-locked two-beam fiber-optic interference lithography (2-FOIL) is numerically and experimentally investigated in this paper. The Dill model is applied in the numerical simulation to understand the effects of an exposure dose and pattern contrast on the exposed photoresist grating profiles. Exposure experiments on the authors' home-built 2-FOIL setup are conducted to demonstrate the suitability for manipulating the linewidth of photoresist gratings by tuning the exposure dose to achieve high aspect ratios over 6 at high pattern contrast thanks to the phase-locking mechanism. The high-aspect-ratio photoresist gratings serve as an excellent etching mask for the subsequent pattern transfer into underlying silicon substrates for high-aspect-ratio silicon gratings. Using these high-aspect-ratio silicon gratings as the nanoimprint mold, a square nanomesh is demonstrated by means of the multiple-step nanoimprint lithography. The authors' work demonstrates that the proposed phase-locked 2-FOIL system enables high pattern contrast under long exposure duration, making it a suitable tool for fabricating high-aspect-ratio grating structures.

EI ; SCI

英语

其他

Hong Kong Arts Development Council[17207419] ; Innovation and Technology Commission - Hong Kong[ITS/297/17]

Engineering ; Science & Technology - Other Topics ; Physics

Engineering, Electrical & Electronic ; Nanoscience & Nanotechnology ; Physics, Applied

WOS:000522021700001

AVS Science and Technology Society

20194207546947

Etching ; Fiber optics ; Locks (fasteners) ; Nanoimprint lithography ; Photoresists

Semiconductor Devices and Integrated Circuits:714.2 ; Fiber Optics:741.1.2 ; Nanotechnology:761 ; Chemical Reactions:802.2 ; Solid State Physics:933

MATERIALS SCIENCE

2-s2.0-85073265547

Scopus

1.Department of Mechanical EngineeringUniversity of Hong Kong,Hong Kong,Hong Kong
2.School of MicroelectronicsSouthern University of Science and Technology,Shenzhen,China
3.Department of Materials Science and EngineeringSouthern University of Science and Technology,Shenzhen,China

Gan，Zhuofei,Cai，Jingxuan,Liang，Chuwei,et al. Patterning of high-aspect-ratio nanogratings using phase-locked two-beam fiber-optic interference lithography[J]. Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics,2019,37(6).

Gan，Zhuofei.,Cai，Jingxuan.,Liang，Chuwei.,Chen，Liyang.,Min，Siyi.,...&Li，Wen Di.(2019).Patterning of high-aspect-ratio nanogratings using phase-locked two-beam fiber-optic interference lithography.Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics,37(6).

Gan，Zhuofei,et al."Patterning of high-aspect-ratio nanogratings using phase-locked two-beam fiber-optic interference lithography".Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics 37.6(2019).